Byoung Hun Lee

Prof. Dr. Byoung Hun Lee

Center for Semiconductor Technology Convergence, Department of Electrical Engineering, Pohang University of Science and Technology, Pohang 790-784, Korea
orcid

Research Focus & Metrics

Academic Career Length

29Years (1998-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

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5 January 2021 in ACS Nano
Verified
Journal Article
Closed access
HJHongyue Jing
Hongyue Jing
HYHyeonwoo Yeo
Hyeonwoo Yeo
BLBenzheng Lyu
Benzheng Lyu
JRJunga Ryou
Junga Ryou
SCSeunghyuk Choi
Seunghyuk Choi
SLSungjoo Lee
Sungjoo Lee

11 January 2018 in ACS Nano
Verified
Journal Article
Closed access
JJJaeho Jeon
Jaeho Jeon
YPYereum Park
Yereum Park
SCSeunghyuk Choi
Seunghyuk Choi
JLJinhee Lee
Jinhee Lee
SLSung Soo Lim
Sung Soo Lim
SLSungjoo Lee
Sungjoo Lee

1 December 2013
Verified
Conference Paper
Closed access
SPS. Park
S. Park
ASA. Sheri
A. Sheri
JKJ. Kim
J. Kim
JNJ. Noh
J. Noh
JJJ. Jang
J. Jang
HHH. Hwang
H. Hwang
We demonstrate an advanced ReRAM based analog artificial synapse for neuromorphic systems. Nitrogen doped TiN/PCMO based artificial synapse is proposed to improve the performance and reliability of the neuromorphic systems by using simple identical spikes. For the first time, we develop fully unsupervised learning with proposed analog synapses which is illustrated with the help of auditory and electroencephalography (EEG) applications.

10 December 2015 in Scientific Reports
Verified
Journal Article
Open access
JJJisu Jang
Jisu Jang
MSMyungwoo Son
Myungwoo Son
SCSunki Chung
Sunki Chung
KKKihyeun Kim
Kihyeun Kim
CCChunhum Cho
Chunhum Cho
MHMoon-Ho Ham
Moon-Ho Ham
There is significant interest in synthesizing large-area graphene films at low temperatures by chemical vapor deposition (CVD) for nanoelectronic and flexible device applications. However, to date, low-temperature CVD methods have suffered from lower surface coverage because micro-sized graphene flakes are produced. Here, we demonstrate a modified CVD technique for the production of large-area, continuous monolayer graphene films from benzene on Cu at 100–300 °C at ambient pressure. In this method, we extended the graphene growth step in the absence of residual oxidizing species by introducing pumping and purging cycles prior to growth. This led to continuous monolayer graphene films with full surface coverage and excellent quality, which were comparable to those achieved with high-temperature CVD; for example, the surface coverage, transmittance and carrier mobilities of the graphene grown at 300 °C were 100%, 97.6% and 1,900–2,500 cm2 V−1 s−1, respectively. In addition, the growth temperature was substantially reduced to as low as 100 °C, which is the lowest temperature reported to date for pristine graphene produced by CVD. Our modified CVD method is expected to allow the direct growth of graphene in device manufacturing processes for practical applications while keeping underlying devices intact.

1 December 2012
Verified
Conference Paper
Closed access
SPS. Park
S. Park
HKH. Kim
H. Kim
MCM. Choo
M. Choo
JNJ. Noh
J. Noh
ASA. Sheri
A. Sheri
HHH. Hwang
H. Hwang
Feasibility of a high speed pattern recognition system using 1k-bit cross-point synaptic RRAM array and CMOS-based neuron chip has been experimentally demonstrated. Learning capability of a neuromorphic system comprising RRAM synapses and CMOS neurons has been confirmed experimentally, for the first time.

16 July 2019 in ACS Nano
Verified
Journal Article
Closed access
YYYajie Yang
Yajie Yang
JJJaeho Jeon
Jaeho Jeon
JPJin-Hong Park
Jin-Hong Park
MJMun Seok Jeong
Mun Seok Jeong
BLByoung Hun Lee
Byoung Hun Lee
SLSungjoo Lee
Sungjoo Lee