Intense X-ray fields produced with hard X-ray free-electron laser (XFEL) have made possible the study of nonlinear X-ray phenomena. However, the observable phenomena are still limited by the power density. Here, we present a two-stage focusing system consisting of ultra-precise mirrors, which can generate an extremely intense X-ray field. The XFEL beam, enlarged with upstream optics, is focused with downstream optics that have high numerical aperture. A grating interferometer is used to monitor the wavefront to achieve optimum focusing. Finally, we generate an extremely small spot of 30 × 55 nm with an extraordinary power density of over 1 × 1020 W cm−2 using 9.9 keV XFEL light. The achieved power density provides novel opportunities to elucidate unexplored nonlinear phenomena in the X-ray region, which will advance development on quantum X-ray optics, astronomical physics and high-energy density science.
The construction of Pohang Accelerator Laboratory X-ray Free-Electron Laser (PAL-XFEL), a 0.1-nm hard X-ray free-electron laser (FEL) facility based on a 10-GeV S-band linear accelerator (LINAC), is achieved in Pohang, Korea by the end of 2016. The construction of the 1.11 km-long building was completed by the end of 2014, and the installation of the 10-GeV LINAC and undulators started in January 2015. The installation of the 10-GeV LINAC, together with the undulators and beamlines, was completed by the end of 2015. The commissioning began in April 2016, and the first lasing of the hard X-ray FEL line was achieved on 14 June 2016. The progress of the PAL-XFEL construction and its commission are reported here.
15 September 2011 in Journal of Physics: Condensed Matter
We have constructed an extremely precise optical system for hard-x-ray nanofocusing in a synchrotron radiation beamline. Precision multilayer mirrors were fabricated, tested, and employed as Kirkpatrick-Baez mirrors with a novel phase error compensator. In the phase compensator, an at-wavelength wavefront error sensing method based on x-ray interferometry and an in situ phase compensator mirror, which adaptively deforms with nanometer precision, were developed to satisfy the Rayleigh criterion to achieve diffraction-limited focusing in a single-nanometer range. The performance of the optics was tested at BL29XUL of SPring-8 and was confirmed to realize a spot size of approximately 7 nm.