In this paper, we propose a novel vertical SU-8 waveguide for evanescent analyte sensing. The waveguide is designed to possess a vertical and narrow structure to generate evanescent waves on both sides of the waveguide’s surface, aimed at increasing the sensitivity by enlarging the sensing areas. We performed simulations to monitor the influence of different parameters on the waveguide’s performance, including its height and width. E-beam lithography was used to fabricate the structure, as this one-step direct writing process enables easy, fast, and high-resolution fabrication. Furthermore, it reduces the sidewall roughness and decreases the induced scattering loss, which is a major source of waveguide loss. Couplers were added to improve the coupling efficiency and alignment tolerance, and will contribute to the feasibility of a plug-and-play optical system. Optical measurements show that the transmission loss is 1.03 ± 0.19 dB/cm. The absorption sensitivity was measured to be 4.8 dB per refractive index unit (dB/RIU) for saline solutions with various concentrations.
In this paper, we present an SU-8 based evanescent waveguide with a vertical structure as a biomedical sensor. The waveguide is designed vertically to generate evanescent waves on both left and right surfaces for sensing. It is fabricated by E-beam lithography with only one-step process which has the advantage of a better surface quality compared with commonly used dry etching methods. Furthermore, fabrication time and cost is cut down greatly. The surface of the designed waveguide can be functionalized with antibodies to immobilize specific bacteria on it. After surface functionalization and incubation with E. coli solutions of different concentrations, the waveguides absorption was measured. The results demonstrate that the waveguide is sensitive to E. coli concentration changes. In addition, tapers were designed and added to the waveguide to relieve the alignment tolerance for the aim of making a plug-and-play bedside diagnostic system.
We systematically investigated the morphology-controlled synthesis of Cu2O micro-nano crystals, especially under surfactant-free conditions, targeting a simple, rapid, and morphologically controllable preparation strategy for polyhedral Cu2O micro-nano crystals. By systematically investigating the effects of NaOH concentration, types of reducing agents, and copper salt precursors on crystal growth, precise control over the morphology of Cu2O crystals under surfactant-free conditions was achieved. This method can rapidly prepare variously faceted Cu2O crystals under mild conditions (70 °C, 7 min), including regular polyhedra with low-index facets exposure including cubes, octahedra and rhombic dodecahedra, as well as more complex polyhedra with high-index facets exposure such as 18-faceted, 26-faceted, 50-faceted and 74-faceted crystals. NaOH concentration is found to be the key factor in controlling Cu2O crystal morphology: as the concentration of NaOH increases, the morphology of Cu2O crystals gradually transforms from cubes that fully expose the {100} faces to regular polyhedra that expose the {110}, {111} faces, and even other high-index faces, ultimately presenting octahedra that fully expose the {111} faces. Additionally, Cu2O crystals with unique morphologies such as hollow cubes and 18-faceted with {110} face etched can be obtained by introducing surfactants or prolonging reaction durations. This work provides new insights into the morphology control of Cu2O crystals and establishes foundation in acquiring distinct Cu2O polyhedra in a facile manner for their application in catalysis, optoelectronics, sensing, and energy conversion fields.
In this Letter, a slope transfer method to fabricate vertical waveguide couplers is proposed. This method utilises wet etched Si as a mask, and takes advantage of dry etching selectivity between Si and SiC, to successfully transfer the profile from the Si master into SiC. By adopting this method, a <2° slope is achieved. Such a taper can bring the coupling efficiency in SiC waveguides to 80% (around 1 dB loss) or better from around 10% (10 dB loss) without taper. It further increases the alignment tolerance at the same time, which ensures the successful development of a plug‐and‐play solution for optical sensing. This is the first reported taper made in SiC.