Parsian K. Mohseni

Prof. Parsian K. Mohseni

Microsystems Engineering, Rochester Institute of Technology, Rochester, NY 14623, USA
orcid

Research Focus & Metrics

Academic Career Length

20Years (2007-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

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21 March 2013 in Physical Review Letters
Verified
Journal Article
Open access
PDF file
AFA. D. K. Finck
A. D. K. Finck
DHD. J. Van Harlingen
D. J. Van Harlingen
PMParsian K. Mohseni
Parsian K. Mohseni
KJK. Jung
K. Jung
XLX. Li
X. Li
We report on transport measurements of an InAs nanowire coupled to niobium nitride leads at high magnetic fields. We observe a zero-bias anomaly (ZBA) in the differential conductance of the nanowire for certain ranges of magnetic field and chemical potential. The ZBA can oscillate in width with either the magnetic field or chemical potential; it can even split and re-form. We discuss how our results relate to recent predictions of hybridizing Majorana fermions in semiconducting nanowires, while considering more mundane explanations.

19 February 2013 in Nano Letters
Verified
Journal Article
Closed access
PMParsian K. Mohseni
Parsian K. Mohseni
ABAshkan Behnam
Ashkan Behnam
JWJoshua D. Wood
Joshua D. Wood
CEChristopher D. English
Christopher D. English
JLJoseph W. Lyding
Joseph W. Lyding
XLXiuling Li
Xiuling Li

20 March 2014 in Advanced Materials
Verified
Journal Article
Closed access
PDF file
PMParsian K. Mohseni
Parsian K. Mohseni
ABAshkan Behnam
Ashkan Behnam
JWJoshua D. Wood
Joshua D. Wood
XZXiang Zhao
Xiang Zhao
KYKi Jun Yu
Ki Jun Yu
XLXiuling Li
Xiuling Li

9 January 2014 in IEEE Electron Device Letters
Verified
Journal Article
Closed access
YSYi Song
Yi Song
CZChen Zhang
Chen Zhang
RDRyan Dowdy
Ryan Dowdy
KCKelson Chabak
Kelson Chabak
PMParsian K. Mohseni
Parsian K. Mohseni
XLXiuling Li
Xiuling Li
III-V junctionless gate-all-around (GAA) nanowire MOSFETs (NWFETs) are experimentally demonstrated for the first time. Source/drain resistance and thermal budget are minimized by regrowth using metalorganic chemical vapor deposition instead of implantation. The fabricated short channel (Lg=80 nm) GaAs GAA NWFETs with extremely scaled NW width (WNW=9 nm) exhibit excellent gm linearity at biases as low as 300 mV, characterized by the high third intercept point (2.6 dbm). The high linearity is insensitive to the bias conditions, which is favorable for low power applications.

18 December 2014 in Nano Letters
Verified
Journal Article
Closed access
SKSeung Hyun Kim
Seung Hyun Kim
PMParsian K. Mohseni
Parsian K. Mohseni
YSYi Song
Yi Song
TITatsumi Ishihara
Tatsumi Ishihara
XLXiuling Li
Xiuling Li

22 December 2014 in Nano Letters
Verified
Journal Article
Closed access
XMXin Miao
Xin Miao
KCKelson Chabak
Kelson Chabak
CZChen Zhang
Chen Zhang
PMParsian K. Mohseni
Parsian K. Mohseni
DWDennis Walker
Dennis Walker
XLXiuling Li
Xiuling Li