TiO2 is a promising environment friendly, low cost, and high electrochemical performance material. However, impediments like high internal ion resistance and low electrical conductivity restrict its applications as electrode for supercapacitor. In the present work, atomic layer deposition was used to fabricate TiO2 nanomembranes (NMs) with accurately controlled thicknesses. The TiO2 NMs were then used as electrodes for high-performance pseudocapacitors. Experimental results demonstrated that the TiO2 NM with 100 ALD cycles had the highest capacitance of 2332 F/g at 1 A/g with energy density of 81 Wh/kg. The enhanced performance was ascribed to the large surface area and the interconnectivity in the case of ultra-thin and flexible NMs. Increased ALD cycles led to stiffer NMs and decreased capacitance. Moreover, one series of two supercapacitors can light up one light-emitting diode with a working voltage of ~ 1.5 V, sufficiently describing its application values.

In this paper, polyethyleneterephthalate (PET) films with and without plasma pretreatment were modified by atomic layer deposition (ALD) and plasma-assisted atomic layer deposition (PA-ALD). It demonstrates that the Al₂O₃ films are successfully deposited onto the surface of PET films. The cracks formed on the deposited Al₂O₃ films in the ALD, plasma pretreated ALD, and PA-ALD were attributed to the energetic ion bombardment in plasmas. The surface wettability in terms of water contact angle shows that the deposited Al₂O₃ layer can enhance the wetting property of modified PET surface. Further characterizations of the Al₂O₃ films suggest that the elevated density of hydroxyl -OH group improve the initial growth of ALD deposition. Chemical composition of the Al₂O₃-coated PET film was characterized by X-ray photoelectron spectroscopy, which shows that the content of C 1s reduces with the growing of O 1s in the Al₂O₃-coated PET films, and the introduction of plasma in the ALD process helps the normal growth of Al₂O₃ on PET in PA-ALD.