Characterization of the morphology, identification of patterns and quantification of order encountered in colloidal assemblies is essential for several reasons. First of all, it is useful to compare different self-assembly methods and assess the influence of different process parameters on the final colloidal pattern. In addition, casting light on the structures formed by colloidal particles can help to get better insight into colloidal interactions and understand phase transitions. Finally, the growing interest in colloidal assemblies in materials science for practical applications going from optoelectronics to biosensing imposes a thorough characterization of the morphology of colloidal assemblies because of the intimate relationship between morphology and physical properties (e.g. optical and mechanical) of a material. Several image analysis techniques developed to investigate images (acquired via scanning electron microscopy, digital video microscopy and other imaging methods) provide variegated and complementary information on the colloidal structures under scrutiny. However, understanding how to use such image analysis tools to get information on the characteristics of the colloidal assemblies may represent a non-trivial task, because it requires the combination of approaches drawn from diverse disciplines such as image processing, computational geometry and computational topology and their application to a primarily physico-chemical process. Moreover, the lack of a systematic description of such analysis tools makes it difficult to select the ones more suitable for the features of the colloidal assembly under examination. In this review we provide a methodical and extensive description of real-space image analysis tools by explaining their principles and their application to the investigation of two-dimensional colloidal assemblies with different morphological characteristics.

Monolayers of self-assembled quasi-spherical colloidal particles are essential building blocks in the field of materials science and engineering. More typically, they are used as a template for the fabrication of nanostructures if they serve, for instance, as a mask for deposition of new material on the surface on which particles are assembled or for etching of the material underneath; in this case, they are removed afterwards. This is what occurs in colloidal or nanosphere lithography. In some other cases, they are not used as a sacrificial material but they are incorporated in the final structure because they are inherently interesting for their properties. Independently of their specific use and application, different strategies have been devised in order to modify size and shape of colloidal particles, so as to enrich the variety of attainable patterns and to tailor the properties of the final structures and materials. In this review, we will focus on one of the most widespread methods to shape spherical colloidal particles, i.e. dry etching techniques. We will follow the development of such approaches until recent days, so as to trace an extensive panorama of the diverse parameters that can be harnessed to achieve specific morphological changes and highlight the characteristic features of the variants of this method. We will finally discuss how particles modified via dry etching can be used for patterning or can be resuspended in solvents for very diverse applications.