Haoliang Sun

Prof. Haoliang Sun


Research Focus & Metrics

Academic Career Length

7Years (2020-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

View All Publications
6 March 2023 in Applied Surface Science
Verified
Journal Article
Closed access
PSPengyan Shi
Pengyan Shi
HSHaoliang Sun
Haoliang Sun
HZHaoge Zhang
Haoge Zhang
SLSaibo Li
Saibo Li
SLShihao Liang
Shihao Liang
GWGuangxin Wang
Guangxin Wang

22 September 2020 in Materials
Verified
Journal Article
Open access
PDF file
HSHaoliang Sun
Haoliang Sun
XLxinxin Lian
xinxin Lian
YLYuanjiang Lv
Yuanjiang Lv
YLYuanhao Liu
Yuanhao Liu
超徐超 徐
超 徐
GWGuangxin Wang
Guangxin Wang
Mo-48.2% Ag films were fabricated by direct current (DC) magnetron sputtering and annealed in an argon atmosphere. The effects of annealing on the surface morphology, resistivity and surface-enhanced Raman scattering (SERS) performance of Mo-48.2% Ag films were investigated. Results show a mass of polyhedral Ag particles grown on the annealed Mo-48.2% Ag films’ surface, which are different from that of as-deposited Mo-Ag film. Moreover, the thickness and the resistivity of Mo-48.2% Ag films gradually decrease as the annealing temperature increases. Furthermore, finite-difference time-domain (FDTD) simulations proved that the re-deposition Ag layer increases the “hot spots” between adjacent Ag nanoparticles, thereby greatly enhancing the local electromagnetic (EM) field. The Ag layer/annealed Mo-48.2% Ag films can identify crystal violet (CV) with concentration lower than 5 × 10−10 M (1 mol/L = 1 M), which indicated that this novel type of particles/films can be applied as ultrasensitive SERS substrates.

5 April 2022 in Materials
Verified
Journal Article
Open access
PDF file
LLLiming Liu
Liming Liu
WLWuhui Li
Wuhui Li
HSHaoliang Sun
Haoliang Sun
GWGuangxin Wang
Guangxin Wang
Three titanium (Ti) targets with different purities were used to prepare Ti films on polyimide substrates by DC magnetron sputtering. The microstructures of Ti films were characterized by a metallographic microscope, X-ray diffractometer, field emission scanning electron microscope and three-dimensional surface topography instrument. In this study, we investigated the effects of Ti target purity and microstructure on film deposition rate, surface roughness, microstructure and resistivity. The results show that the deposition rate increased with increasing Ti target purity. Ti film deposited by the high-purity (99.999%) Ti target has fewer surface particles with smaller size, lower surface roughness and lower resistivity when compared to that prepared by the Ti target of low purity (99.7%). The surface roughness of Ti film prepared by the high-purity Ti target was Sa = 121 nm, the deposition rate was 16.3 nm/min and the resistivity was 6.9 × 10−6 Ω·m. For Ti targets of the same purity, the performance of Ti film prepared by a target with equiaxed α-phase grains is better than that of Ti film prepared by a target with twins and β-phase grains.

9 February 2024 in ACS Applied Nano Materials
Verified
Journal Article
Closed access
SLShihao Liang
Shihao Liang
SLSaibo Li
Saibo Li
MSMingshuai Shen
Mingshuai Shen
HZHaitao Zheng
Haitao Zheng
HSHaoliang Sun
Haoliang Sun
GWGuangxin Wang
Guangxin Wang

2 January 2023 in ACS Applied Nano Materials
Verified
Journal Article
Closed access
HZHaoge Zhang
Haoge Zhang
PSPengyan Shi
Pengyan Shi
YLYuanjiang Lv
Yuanjiang Lv
SLShihao Liang
Shihao Liang
SLSaibo Li
Saibo Li
GWGuangxin Wang
Guangxin Wang

1 March 2024 in Surfaces and Interfaces
Verified
Journal Article
Closed access
SLSaibo Li
Saibo Li
SLShihao Liang
Shihao Liang
HZHaoge Zhang
Haoge Zhang
PSPengyan Shi
Pengyan Shi
HZHaitao Zheng
Haitao Zheng
GWGuangxin Wang
Guangxin Wang