Jaewon Jang

Dr. Jaewon Jang

orcid

Research Focus & Metrics

Academic Career Length

15Years (2012-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

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14 November 2012 in Advanced Materials
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Journal Article
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JJJaewon Jang
Jaewon Jang
RKRungrot Kitsomboonloha
Rungrot Kitsomboonloha
SSSarah L. Swisher
Sarah L. Swisher
EPEung Seok Park
Eung Seok Park
Hongki KangHongki Kang
Hongki Kang
VSVivek Subramanian
Vivek Subramanian

12 June 2012 in Advanced Materials
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Journal Article
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JJJaewon Jang
Jaewon Jang
FPFeng Pan
Feng Pan
KBKyle Braam
Kyle Braam
VSVivek Subramanian
Vivek Subramanian

20 August 2019 in Advanced Optical Materials
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Journal Article
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WLWon‐Yong Lee
Won‐Yong Lee
SHSeunghyun Ha
Seunghyun Ha
HLHyunjae Lee
Hyunjae Lee
JBJin‐Hyuk Bae
Jin‐Hyuk Bae
BJBongho Jang
Bongho Jang
JJJaewon Jang
Jaewon Jang

4 December 2017 in IEEE Electron Device Letters
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Journal Article
Closed access
SLSojeong Lee
Sojeong Lee
WLWon-Yong Lee
Won-Yong Lee
BJBongho Jang
Bongho Jang
TKTaegyun Kim
Taegyun Kim
JBJin-Hyuk Bae
Jin-Hyuk Bae
JJJaewon Jang
Jaewon Jang
Solution-p-type thin-film transistors, consisting of sol-gel-processed CuO films, were fabricated. The optoelectric properties of sol-gel-processed, CuO-based back gate thin-film transistors were investigated, and a detectivity of 1.38 ×10 11 (cm Hz1/2 W -1) was achieved. This detectivity for sol-gel-processed CuO thin-film transistors is higher than that of the previously reported layered two-dimensional material systems and comparable to that of devices based on a one-dimensional nanowire system. Our results indicate that the sol-gel–processed, CuO-based photodetector system is a promising candidate for applications such as near-infrared (NIR) imaging devices, sensors, solar cells, and p-type inks for future printed electronics.

28 March 2018 in IEEE Electron Device Letters
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Journal Article
Closed access
SLSojeong Lee
Sojeong Lee
TKTaegyun Kim
Taegyun Kim
BJBongho Jang
Bongho Jang
WLWon-Yong Lee
Won-Yong Lee
KSKyu Chan Song
Kyu Chan Song
JJJaewon Jang
Jaewon Jang
A sol-gel-processed ZrO2 layer was used as an active layer for a resistive random-access memory (RRAM). With top Ag electrodes, the fabricated devices show conventional bipolar switching memory properties. The impacts of device size and ZrO2 film thickness on device performance were investigated. The scaling of the device area and the successful increase in ZrO2 film thickness increased the high-resistance state (HRS)/low-resistance state (LRS) ratio values and improved the non-volatile memory properties, such as retention and endurance. The fabricated ITO/ZrO2/Ag RRAM shows good retention and endurance properties. The HRS and LRS were found to last for 104 s without any significant degradation.