The volume reflection phenomenon was detected while investigating 400 GeV proton interactions with bent silicon crystals in the external beam H8 of the CERN Super Proton Synchrotron. Such a process was observed for a wide interval of crystal orientations relative to the beam axis, and its efficiency exceeds 95%, thereby surpassing any previously observed value. These observations suggest new perspectives for the manipulation of high-energy beams, e.g., for collimation and extraction in new-generation hadron colliders, such as the CERN Large Hadron Collider.

We report the observation of efficient steering of a 855 MeV electron beam at MAMI (MAinzer MIkrotron) facilities by means of planar channeling and volume reflection in a bent silicon crystal. A $30.5\mu \mathrm{m}$ thick plate of (211) oriented Si was bent to cause quasimosaic deformation of the (111) crystallographic planes, which were used for coherent interaction with the electron beam. The experimental results are analogous to those recorded some years ago at energy higher than 100 GeV, which is the only comparable study to date. Monte Carlo simulations demonstrated that rechanneling plays a considerable role in a particle’s dynamics and hinders the spoiling of channeled particles. These results allow a better understanding of the dynamics of electrons subject to coherent interactions in a bent silicon crystal in the sub-GeV energy range, which is relevant for realization of innovative x-ray sources based on channeling in periodically bent crystals.

B migration in Si and Ge matrices raised a vast attention because of its influence on the production of confined, highly p-doped regions, as required by the miniaturization trend. In this scenario, the diffusion of B atoms can take place under severe conditions, often concomitant, such as very large concentration gradients, non-equilibrium point defect density, amorphous-crystalline transition, extrinsic doping level, co-doping, B clusters formation and dissolution, ultra-short high-temperature annealing. In this paper, we review a large amount of experimental work and present our current understanding of the B diffusion mechanism, disentangling concomitant effects and describing the underlying physics. Whatever the matrix, B migration in amorphous (α-) or crystalline (c-) Si, or c-Ge is revealed to be an indirect process, activated by point defects of the hosting medium. In α-Si in the 450-650 °C range, B diffusivity is 5 orders of magnitude higher than in c-Si, with a transient longer than the typical amorphous relaxation time. A quick B precipitation is also evidenced for concentrations larger than 2 × 1020 B/cm3. B migration in α-Si occurs with the creation of a metastable mobile B, jumping between adjacent sites, stimulated by dangling bonds of α-Si whose density is enhanced by B itself (larger B density causes higher B diffusivity). Similar activation energies for migration of B atoms (3.0 eV) and of dangling bonds (2.6 eV) have been extracted. In c-Si, B diffusion is largely affected by the Fermi level position, occurring through the interaction between the negatively charged substitutional B and a self-interstitial (I) in the neutral or doubly positively charged state, if under intrinsic or extrinsic (p-type doping) conditions, respectively. After charge exchanges, the migrating, uncharged BI pair is formed. Under high n-type doping conditions, B diffusion occurs also through the negatively charged BI pair, even if the migration is depressed by Coulomb pairing with n-type dopants. The interplay between B clustering and migration is also modeled, since B diffusion is greatly affected by precipitation. Small (below 1 nm) and relatively large (5-10 nm in size) BI clusters have been identified with different energy barriers for thermal dissolution (3.6 or 4.8 eV, respectively). In c-Ge, B motion is by far less evident than in c-Si, even if the migration mechanism is revealed to be similarly assisted by Is. If Is density is increased well above the equilibrium (as during ion irradiation), B diffusion occurs up to quite large extents and also at relatively low temperatures, disclosing the underlying mechanism. The lower B diffusivity and the larger activation barrier (4.65 eV, rather than 3.45 eV in c-Si) can be explained by the intrinsic shortage of Is in Ge and by their large formation energy. B diffusion can be strongly enhanced with a proper point defect engineering, as achieved with embedded GeO2 nanoclusters, causing at 650 °C a large Is supersaturation. These aspects of B diffusion are presented and discussed, modeling the key role of point defects in the two different matrices.

The precise C content of a series of ${\mathrm{Si}}_{\text{1−y}}{\mathrm{C}}_y$ epilayer samples $\text{(0<y<0.012)}$ was determined by resonant backscattering experiments using a ${}^4{\mathrm{He}}^{\mathrm{+}}$ ion beam at 5.72 MeV. This beam energy is more suitable for the determination of the C content than the previously used 4.265 MeV. From the correlation of these investigations with x-ray diffraction experiments, a significant deviation of the lattice parameter variation in ${\mathrm{Si}}_{\text{1−y}}{\mathrm{C}}_y$ from Vegard’s rule between Si and diamond or β-SiC was observed, which amounts up to 30% or 13%, respectively, for $\text{y<0.012.}$ This negative deviation is in agreement with recent theoretical predictions by Kelires.

In this work the Si self-interstitial–carbon interaction has been experimentally investigated and modeled. The interactions between self-interstitials, produced by 20-keV silicon implantation, and substitutional carbon in silicon have been studied using a ${\mathrm{Si}}_{1-y}{\mathrm{C}}_y$ layer grown by molecular beam epitaxy (MBE) and interposed between the near-surface self-interstitial source and a deeper B spike used as a marker for the Si-interstitial concentration. The C atoms, all incorporated in substitutional sites and with a C-dose range of $7\times {10}^{12}–4\times {10}^{14}{\mathrm{a}\mathrm{t}\mathrm{o}\mathrm{m}\mathrm{s}/\mathrm{c}\mathrm{m}}^2,$ trap the self-interstitials in such a manner that the ${\mathrm{Si}}_{1-y}{\mathrm{C}}_y$ layer behaves as a filtering membrane for the interstitials flowing towards the bulk and, consequently, strongly reduces the boron-enhanced diffusion. This trapping ability is related to the total C dose in the ${\mathrm{Si}}_{1-y}{\mathrm{C}}_y$ membrane. Substitutional carbon atoms interacting with self-interstitials are shown to trap Si interstitials, to be removed from their substitutional sites, and to precipitate into the C-rich region. After precipitation, C atoms are not able to further trap injected self-interstitials, and the interstitials generated in the surface region can freely pass through the C-rich region and produce B-enhanced diffusion. The atomistic mechanism leading to Si-interstitial trapping has been investigated by developing a simulation code describing the migration of injected interstitials. The simulation takes into account the surface recombination, the interstitial diffusion in our MBE-grown material, and C traps. Since the model calculates the amount of interstitials that actually react with C atoms, by a comparison with the experimental data it is possible to derive quantitative indications of the trapping mechanism. It is shown that one Si interstitial is able to deactivate about two C traps by means of interstitial trapping and C clustering reactions. The reaction causing trapping and deactivation is tentatively described.