A multi-objective genetic algorithm approach is formulated to optimize the design of silicon-photonics complex circuits with contradicting performance metrics and no closed-form expression for the circuit performance. A case study is the interleaver/deinterleaver circuit which mixes/separates optical signals into/from different physical channels while preserving the wavelength-division-multiplexing specifications. These specifications are given as channel spacing of 50 GHz, channel 3-dB bandwidth of at least 20 GHz, channel free spectral range of 100 GHz, crosstalk of −23 dB or less, and signal dispersion less than 30 ps/nm. The essence of the proposed approach lies in the formulation of the fitness functions and the selection criteria to optimize the values of the three coupling coefficients, which govern the circuit performance, in order to accommodate the contradicting performance metrics of the circuit. The proposed approach achieves the optimal design in an incomparably short period of time when contrasted with the previous tedious design method based on employing Z-transform and visual inspection of the transmission poles and zeros.

Introducing high speed networks, such as the fifth generation of mobile technology and related applications including the internet of things, creates a pressing demand for hardware infrastructure that provides sufficient bandwidth. Here, silicon-based microwave-photonics presents a solution that features easy and inexpensive fabrication through a mature platform that has long served the electronics industry. In this work, the design of an electro-optic modulator is proposed where the ‘fin’ structure is adopted from the domain of electronics devices, with emphasis on the high speed of operation. The proposed modulator is customized to provide a bandwidth of 90 GHz with a small phase shifter length of 800 μm and an optical insertion loss of 4 dB. With such a speed, this proposed modulator fits high-speed applications such as modern tele-communications systems.

In this work, new polymeric based films are fabricated and optically characterized. The new films include poly(vinyl alcohol), plain and blended with poly(vinyl pyrrolidone), comprising glycerin, and acetic acid,as additives. XRD and FTIR analysis were conducted to give insight into the structure of the films. The reflectance and transmittance for these films are measured in the UV–vis–NIR regions. Using these measurements, the refractive index, the permittivity and many other optical constants are retrieved. The results reveal that the fabricated films possess an extinction coefficient that is almost 3 times less, and a refractive index that is 0.1 higher than plain PVA in the telecommunications wavelength range. Besides, a noticeable increase in the refractive index of the films is achieved, up to 0.35 higher compared with silicon dioxide at the near infrared spectral region. Moreover, when compared to silicon and Germanium, in the ultraviolet and visible spectral region, a substantial reduction of 3 to 4 orders of magnitudes in extinction coefficient is achieved, in the favor of the investigated films. Interestingly, the films also show small dispersion over a wide range of wavelength. Therefore, the newly proposed films can be candidates for optoelectronics, solar cells, and integrated optics applications where high refractive index and low loss are desired for high density of fabrication.