The light scattering of rough metallic surfaces with roughness levels ranging from a few to several hundred nanometers is modeled and compared to experimental data. Different modeling approaches such as the classical Rayleigh-Rice vector perturbation theory and the new Generalized Harvey-Shack theory are used and critically assessed with respect to ranges of validity, accuracy, and practicability. Based on theoretical calculations and comparisons with Rigorous Coupled Wave Analysis for sinusoidal phase gratings, it is demonstrated that the approximate scatter models yield surprisingly accurate results and at the same time provide insight into light scattering phenomena. For stochastically rough metal surfaces, the predicted angles resolved scattering is compared to experimental results at 325 nm, 532 nm, and 1064 nm. In addition, the possibilities of retrieving roughness information from measured scattering data for different roughness regimes are discussed.

Light scattered from interface imperfections carries valuable information about its origins. For single surfaces, light-scattering techniques have become a powerful tool for the characterization of surface roughness. For thin-film coatings, however, solving the inverse scattering problem seemed to be impossible because of the large number of parameters involved. A simplified model is presented that introduces two parameters: Parameter δ describes optical thickness deviations from the perfect design, and param eter β describes the roughness evolution inside the coating according to a power law. The new method is used to investigate structural and alteration effects of HR coatings for $193\mathrm{nm}$, as well as laser-induced degradation effects in Rugate filters for $355\mathrm{nm}$.

Roughness-induced light scattering critically affects the performance of optical components, in particular at short wavelengths. We present a stand-alone instrument for angle-resolved scattering and reflectance measurements at $13.5\mathrm{nm}$ in the extreme-ultraviolet (EUV) spectral range. The achieved dynamic range allows even the scattering of high-quality EUV mirrors on extremely smooth substrates to be investigated. For Mo/Si multilayers, total scatter losses of several percent have been observed, depending on the substrate qualities as well as on roughening and smoothing effects during coating. Different approximate models for estimating the impact of roughness on scatter losses are discussed and compared with experimental results.

The light scattering of interference coatings is strongly dependent on the wavelength. In addition to the general strong increase of scattering as the wavelengths get shorter, dramatic scatter effects in and around the resonance regions can occur. This is discussed in detail for highly reflective and chirped mirrors. A new instrument is presented which enables spectral angle resolved scatter measurements of high-quality optical components to be performed between 250 and 1500 nm.

In every advanced optical system, light scattering caused by the imperfections of optical components sooner or later becomes an issue that needs to be addressed. Light scattering can be a critical factor for both the throughput and the imaging quality of optical systems. On a component level, the quantities to describe these effects are the scatter loss or total scattering (TS) and the scattering distribution function or angle-resolved light scattering (ARS). In the last decades, a number of instruments have been developed worldwide for the measurement of TS and ARS. However, numerous pitfalls have to be avoided to obtain objective, reliable, and reproducible measurement results. This is, in particular, true for low scatter levels of high-end optical components. Standard procedures that have to be both concise and easy to implement are thus of crucial importance for the optics community. This paper tries to give an overview on existing standards as well as an outlook on new standards that are still being developed. Special emphasis is put on ISO standards jointly developed, reviewed, and revised by the international experts in the field.

Titanium dioxide films were prepared by plasma ion-assisted electron beam evaporation. Linear optical properties were investigated in terms of spectrophotometry using the beta-distributed oscillator (ß_do) model as a parametrized dispersion law. The nonlinear two-photon absorption coefficient of titanium dioxide was determined by means of the laser-induced deflection technique at a wavelength of 800 nm. The obtained values of (2–5) × 10⁻¹¹ cm/W were consistent with published experimental values for rutile as well as for simulations performed in the frames of the ß_do and Sheik–Bahae models.