Haichao Cai

Dr. Haichao Cai

orcid

Research Focus & Metrics

Academic Career Length

11Years (2016-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

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19 February 2020 in Materials Research Express
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Journal Article
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HCHaichao Cai
Haichao Cai
YXYujun Xue
Yujun Xue
JHJiang Tao He
Jiang Tao He
FYFang Yang
Fang Yang
XMXiqiang Ma
Xiqiang Ma
The properties of Physical Vacuum Deposit (PVD) films could be improved by doping rare earth elements and other metal elements. In this paper, La-Ti/WS2 composite films were prepared by unbalanced magnetron sputtering. The effect of target power on the structure and properties of La-Ti/WS2 composite films was studied. Scanning electron microscopy (SEM) and x-ray diffraction (XRD) were used to analyze the micro morphology, composition and crystal structure of the film. The hardness and friction and wear properties of the film were tested by nano-indentation and friction and wear testing machine. The results show that the structure and composition of La-Ti/WS2 composite films prepared by magnetron sputtering are affected by the target power. With the increase of the target power, the diffraction peak of WS2 (002) was shifted to the low θ value, the crystal surface spacing was decreased, the crystal lattice shrinked, the porous structure of La-Ti/WS2 composite films was decreased significantly, the coarse columnar crystal was refined significantly, and the film density was improved effectively. When the target power is 20 W, the sliding surface of La-Ti/WS2 composite film (002) is parallel to the surface, showing lower friction coefficient and better wear resistance; when the target power is 50 W, La-Ti/WS2 composite film has higher hardness, higher wear rate and poor wear resistance. The density and friction and wear properties of La-Ti/WS2 composite films can be improved by suitable La-Ti content.

23 September 2024 in Lubricants
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Journal Article
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HCHaichao Cai
Haichao Cai
PGPengge Guo
Pengge Guo
YXYu jun XUE
Yu jun XUE
LPLulu Pei
Lulu Pei
LGLeo Garry
Leo Garry
JYJun Ye
Jun Ye
In the existing literature, there are few studies on the effect of deposition bias on the tribological properties of carbon-doped high-entropy alloy coatings. In order to further study the effect of the deposition bias on the properties of coatings, (AlTiVCrNb)CxNy coatings were deposited via unbalanced RF magnetron sputtering. The microstructure and tribological properties of carbon-doped high-entropy alloy ceramic coatings under different deposition biases were studied. The composition, morphology, crystal structure, and chemical morphology of each element of the coating were analyzed using scanning electron microscopy (SEM), X-ray diffraction (XRD), and X-ray photoelectron spectroscopy (XPS). The hardness, elastic modulus, friction, and wear properties of the coating were further characterized using a nanoindentation instrument, reciprocating sliding friction, a wear tester, and a white light interferometer. The coating density reached the optimal level when the deposition bias value was 90 V. The hardness and elastic modulus of the (AlTiVCrNb)CxNy coating increased first and then decreased with an increase in deposition bias, and the maximum hardness was 23.98 GPa. When the deposition bias was 90 V, the coating formed a good-quality carbon transfer film on the surface of the counterbody due to sp2 clusters during the friction and wear process. The average friction coefficient and wear rate of the (AlTiVCrNb)CxNy coating were the lowest, 0.185 and 1.6 × 10−7 mm3/N·m, respectively. The microstructure, mechanical properties, and tribological performance of the (AlTiVCrNb)CxNy coating were greatly affected by the change in deposition bias, and an (AlTiVCrNb)CxNy coating with excellent structure and friction properties could be prepared using graphite co-sputtering.

31 October 2016 in International Journal of Signal Processing, Image Processing and Pattern Recognition
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Journal Article
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HCHaichao Cai
Haichao Cai
CXChunguang Xu
Chunguang Xu
QPQinxue Pan
Qinxue Pan
HYHongjuan Yan
Hongjuan Yan