Single-photon emitters (SPEs) play an important role in a number of quantum information tasks such as quantum key distributions. In these protocols, telecom wavelength photons are desired due to their low transmission loss in optical fibers. In this paper, we present a study of bright single-photon emitters in cubic silicon carbide (3C-SiC) emitting in the telecom range. We find that these emitters are photostable and bright at room temperature with a count rate of ~ MHz. Altogether with the fact that SiC is a growth and fabrication-friendly material, our result may be relevant for future applications in quantum communication technology.

In this paper, the revised Heyd-Scuseria-Ernzerhof screened hybrid functional (HSE06) is used to investigate the interaction between hydrogen with different concentrations and gallium vacancies in β-Ga₂O₃. The hydrogen can compensate a gallium vacancy by forming hydrogen-vacancy complex. A gallium vacancy can bind up to four hydrogen atoms, and formation energies decrease as the number of hydrogen atoms increases. Hydrogen prefers to bind with three coordinated oxygen. The bonding energy and annealing temperatures of complexes containing more than two hydrogen atoms are computed, and show relatively high stability. In addition, vacancy concentrations increase with the increasing vapor pressures. This paper can effectively explain the hydrogen impact in β-Ga₂O₃.

The leakage current degradation, single-event burnout (SEB), and single-event gate rupture (SEGR) behaviors induced by the heavy-ion irradiation in p-Channel and n-Channel power U-shaped metal–oxide–semiconductor field-effect transistors (UMOSFETs) are comparatively investigated in this article via experiments and simulations. The SEB and SEGR performances of a commercially available −100-V-rated p-Channel UMOSFET are tested under heavy-ion irradiation. The experimental results show that the sample devices can be prevented from the drain leakage current or gate leakage current degradation under the bias conditions of $V_{\mathrm {GS}} = -100$ V and $V_{\mathrm {GS}} = 0$ . However, a severe gate leakage current degradation can occur at $V_{\mathrm {DS}} = -100$ V when $V_{\mathrm {GS}} \ge 5$ V. In addition, the SEB and SEGR characteristics of a 100-V-rated n-Channel UMOSFET are obtained by simulations. The simulation results indicate that a p-Channel UMOSFET can achieve much better robustness against heavy ions compared with an n-Channel UMOSFET. Further, the leakage current degradation and failure mechanisms induced by heavy-ion irradiation are investigated via simulations. Finally, an effective method, which enlarges the width and depth of the source contact trench, is introduced to enhance the SEB tolerance of an n-Channel UMOSFET. The simulation result shows that the SEB threshold voltage can represent an increase of 23.1% with the hardening method.

In this article, the performance and triggering mechanism of the single-event burnout (SEB) of a 4H-SiC trench-gate (TG) MOSFET structure are evaluated by the 2-D numerical simulations. The novel N⁺ island buffer 4H-SiC TG MOSFET and the conventional TG 4H-SiC MOSFET are analyzed and compared to examine whether an N⁺ island region introduced in the second buffer can effectively reduce the impact ionization located at the N⁻ drift/N⁺ buffer junction and improve device tolerance to the SEB. The TCAD simulation results revealed that compared with the conventional structure, which is a simple double-buffer structure, the N⁺ island buffer-hardened structure changed the burnout threshold voltage, improving the SEB performance significantly. In addition, the results proved that the impact ionization played an important role in the SEB triggering mechanism, significantly affecting the SEB performance of the 4H-SiC TG MOSFET. The performance of the hardened N⁺ island buffer with a different dopant concentration of N-buffer 2 and a size of N⁺ island is discussed. The specific burnout threshold voltage at the optimal parameters of the proposed structure is 47% higher than that of the conventional structure.