Shu-Jui Chang received Ph.D. from the Department of Materials Science and Engineering at National Chiao Tung University (NCTU) in 2017. His Ph.D. thesis was focused on utilizing synchrotron-based x-ray diffraction (XRD) and x-ray absorption spectroscopy (XAS) techniques to explore the structure and magnetism in functional magnetic materials. In 2018, he took a postdoctoral researcher at NCTU and was a visiting researcher at the University of California, Berkeley (UC Berkeley). Currently, he is an associate researcher at International College of Semiconductor Technology (ICST), National Yang Ming Chiao Tung University (NYCU). His current research is focused on developing ferroelectric HfZrO2 films and dielectric layer growth on 2D semiconductors with the atomic layer deposition technique.