Atomic layer deposition (ALD) provides a promising route for depositing uniform thin-film electrodes for Li-ion batteries. In this work, bis(methylcyclopentadienyl) nickel(II) (Ni(MeCp)₂) and bis(cyclopentadienyl) nickel(II) (NiCp₂) were used as precursors for NiO ALD. Oxygen plasma was used as a counter-reactant. The films were studied by spectroscopic ellipsometry, scanning electron microscopy, atomic force microscopy, X-ray diffraction, X-ray reflectometry, and X-ray photoelectron spectroscopy. The results show that the optimal temperature for the deposition for NiCp₂ was 200–300 °C, but the optimal Ni(MeCp)₂ growth per ALD cycle was 0.011–0.012 nm for both precursors at 250–300 °C. The films deposited using NiCp₂ and oxygen plasma at 300 °C using optimal ALD condition consisted mainly of stoichiometric polycrystalline NiO with high density (6.6 g/cm³) and low roughness (0.34 nm). However, the films contain carbon impurities. The NiO films (thickness 28–30 nm) deposited on stainless steel showed a specific capacity above 1300 mAh/g, which is significantly more than the theoretical capacity of bulk NiO (718 mAh/g) because it includes the capacity of the NiO film and the pseudo-capacity of the gel-like solid electrolyte interface film. The presence of pseudo-capacity and its increase during cycling is discussed based on a detailed analysis of cyclic voltammograms and charge–discharge curves (U(C)).

Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas–solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin conformal inorganic material layers for various applications. ALD has been discovered and developed independently, at least twice, under different names: atomic layer epitaxy (ALE) and molecular layering. ALE, dating back to 1974 in Finland, has been commonly known as the origin of ALD, while work done since the 1960s in the Soviet Union under the name “molecular layering” (and sometimes other names) has remained much less known. The virtual project on the history of ALD (VPHA) is a volunteer-based effort with open participation, set up to make the early days of ALD more transparent. In VPHA, started in July 2013, the target is to list, read and comment on all early ALD academic and patent literature up to 1986. VPHA has resulted in two essays and several presentations at international conferences. This paper, based on a poster presentation at the 16th International Conference on Atomic Layer Deposition in Dublin, Ireland, 2016, presents a recommended reading list of early ALD publications, created collectively by the VPHA participants through voting. The list contains 22 publications from Finland, Japan, Soviet Union, United Kingdom, and United States. Up to now, a balanced overview regarding the early history of ALD has been missing; the current list is an attempt to remedy this deficiency.

Lithium nickelate (LiNiO₂) and materials based on it are attractive positive electrode materials for lithium-ion batteries, owing to their large capacity. In this paper, the results of atomic layer deposition (ALD) of lithium–nickel–silicon oxide thin films using lithium hexamethyldisilazide (LiHMDS) and bis(cyclopentadienyl) nickel (II) (NiCp₂) as precursors and remote oxygen plasma as a counter-reagent are reported. Two approaches were studied: ALD using supercycles and ALD of the multilayered structure of lithium oxide, lithium nickel oxide, and nickel oxides followed by annealing. The prepared films were studied by scanning electron microscopy, spectral ellipsometry, X-ray diffraction, X-ray reflectivity, X-ray photoelectron spectroscopy, time-of-flight secondary ion mass spectrometry, energy-dispersive X-ray spectroscopy, transmission electron microscopy, and selected-area electron diffraction. The pulse ratio of LiHMDS/Ni(Cp)₂ precursors in one supercycle ranged from 1/1 to 1/10. Silicon was observed in the deposited films, and after annealing, crystalline Li₂SiO₃ and Li₂Si₂O₅ were formed at 800 °C. Annealing of the multilayered sample caused the partial formation of LiNiO₂. The obtained cathode materials possessed electrochemical activity comparable with the results for other thin-film cathodes.

Nowadays, lithium-ion batteries (LIBs) are one of the most convenient, reliable, and promising power sources for portable electronics, power tools, hybrid and electric vehicles. The characteristics of the positive electrode (cathode active material, CAM) significantly contribute to the battery’s functional properties. Applying various functional coatings is one of the productive ways to improve the work characteristics of lithium-ion batteries. Nowadays, there are many methods for depositing thin films on a material’s surface; among them, one of the most promising is atomic layer deposition (ALD). ALD allows for the formation of thin and uniform coatings on surfaces with complex geometric forms, including porous structures. This review is devoted to applying the ALD method in obtaining thin functional coatings for cathode materials and includes an overview of more than 100 publications. The most thoroughly investigated surface modifications are lithium cobalt oxide (LCO), lithium manganese spinel (LMO), lithium nickel-cobalt-manganese oxides (NCM), lithium-nickel-manganese spinel (LNMO), and lithium-manganese rich (LMR) cathode materials. The most studied processes of deposition are aluminum oxide (Al₂O₃), titanium dioxide (TiO₂) and zirconium dioxide (ZrO₂) films. The primary purposes of such studies are to find the synthesis parameters of films, to find the optimal coating thickness (e.g., ~1–2 nm for Al₂O₃, ~1 nm for ZrO₂, <1 nm for TiO₂, etc.), and to reveal the effect of the coating on the electrochemical parameters of batteries. The review summarizes synthesis conditions, investigation results of deposited films on CAMs and positive electrodes and some functional effects observed due to films obtained by ALD on cathodes.