Koichi Endo

Koichi Endo

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Koichi Endo

Discrete Semiconductor Quality & Reliability Engineering Department, Toshiba Electronic Devices & Storage Corporation, Kawasaki 212-8583, Japan

Research Focus & Metrics

Academic Career Length

32Years (1995-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

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12 November 2019 in IEEE Transactions on Device and Materials Reliability
Verified
Journal Article
Closed access
KEKoichi Endo
Koichi Endo
KNKoji Nakamae
Koji Nakamae

1 August 2015 in Microelectronics Reliability
Verified
Journal Article
Closed access
KEKoichi Endo
Koichi Endo
KNKenji Norimatsu
Kenji Norimatsu
TNTomonori Nakamura
Tomonori Nakamura
TSTakashi Setoya
Takashi Setoya
KNKoji Nakamae
Koji Nakamae

1 February 1995 in Bioorganic & Medicinal Chemistry Letters
Verified
Journal Article
Closed access
AKAkira Kawase
Akira Kawase
MHMichinori Hirata
Michinori Hirata
KEKoichi Endo
Koichi Endo
NKNoboru Kubodera
Noboru Kubodera

1 August 2015 in Microelectronics Reliability
Verified
Journal Article
Closed access
TSTakashi Setoya
Takashi Setoya
TOTsuneo Ogura
Tsuneo Ogura
WSWataru Saito
Wataru Saito
TMTomoko Matsudai
Tomoko Matsudai
KEKoichi Endo
Koichi Endo

20 June 2018 in Japanese Journal of Applied Physics
Verified
Journal Article
Closed access
PDF file
KEKoichi Endo
Koichi Endo
YMYoshihiro Midoh
Yoshihiro Midoh
TNTomonori Nakamura
Tomonori Nakamura
TMToru Matsumoto
Toru Matsumoto
KKKazushige Koshikawa
Kazushige Koshikawa
KNKoji Nakamae
Koji Nakamae
The amount of light reflected from the light-irradiated device varies depending on the surface temperature at that location. In this paper, we show that, by using an incoherent light beam with a noninvasive wavelength, it is possible to measure the temperature change of the interconnect structure with a size of µm order Si semiconductor devices. As a method of measuring the temperature change, lock-in thermography has been reported. However, it is difficult to measure the temperature change of the fine structure. The spatial resolution of this method is about 10 µm. Here, by using a noninvasive incoherent light beam, the spatial resolution of µm order is achieved. We applied this method to a 4-µm-wide interconnect test element group (TEG) device with a passivation film to observe the temperature change of the interconnect structure.

2 November 2026 in Japanese Journal of Applied Physics
Verified
Journal Article
Open access
MHMasaki Hasegawa
Masaki Hasegawa
KEKoichi Endo
Koichi Endo
SYShinji Yokogawa
Shinji Yokogawa
JSJunji Senzaki
Junji Senzaki
Accurate identification of crystallographic defects in 4H-SiC epitaxial wafers is essential for ensuring the yield and reliability of SiC power devices. Although a variety of inspection techniques have been developed, defect visibility varies substantially among characterization methods, making reliable automated defect classification challenging. In this study, a multi-channel defect identification framework that integrates optical inspection, photoluminescence, and X-ray topography using a convolutional neural network was developed. Images acquired by the three techniques were spatially registered and combined into multi-channel datasets for analysis. A Faster R-CNN was trained using annotated data collected from 18 epitaxial wafers. The trained model was evaluated using an independent test wafer containing reliability-relevant defects, including micropipes, basal plane dislocations, threading screw dislocations, stacking faults, stacking-fault complexes, polytype inclusions, and particle inclusions. Compared with models trained on individual inspection modalities, the multi-channel model exhibited improved classification performance through the integration of complementary morphological, luminescence, and crystallographic information.