Wenda Su

Mr. Wenda Su

Key Laboratory for Thin Film and Microfabrication Technology of the Ministry of Education, Department of Microelectronics and Nanoscience, School of Electronics Information and Electrical Engineering, Shanghai Jiao Tong University, Dong Chuan Road No. 800, Shanghai 200240, China

Research Focus & Metrics

Academic Career Length

6Years (2021-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

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28 May 2021 in Materials
Verified
Journal Article
Open access
PDF file
WSWenda Su
Wenda Su
FZFangfang Zhao
Fangfang Zhao
LMLei Ma
Lei Ma
RTRuixian Tang
Ruixian Tang
YDYanru Dong
Yanru Dong
LWLiangming Wei
Liangming Wei
Aluminum hydride (AlH3) is a binary metal hydride with a mass hydrogen density of more than 10% and bulk hydrogen density of 148 kg H2/m3. Pure aluminum hydride can easily release hydrogen when heated. Due to the high hydrogen density and low decomposition temperature, aluminum hydride has become one of the most promising hydrogen storage media for wide applications, including fuel cell, reducing agents, and rocket fuel additive. Compared with aluminum powder, AlH3 has a higher energy density, which can significantly reduce the ignition temperature and produce H2 fuel in the combustion process, thus reducing the relative mass of combustion products. In this paper, the research progress about the structure, synthesis, and stability of aluminum hydride in recent decades is reviewed. We also put forward the challenges for application of AlH3 and outlook the possible opportunity for AlH3 in the future.