This study is concerned with the photoluminescence spectra and electrical parameters of AlGaAs/InGaAs/GaAs pseudomorphic high-electron-mobility transistor (P-HEMT) structures with a quantum well...

The terahertz wave generation by spiral photoconductive antennas fabricated on low-temperature In_0.5Ga_0.5As films and In_0.5Ga_0.5As/In_0.5Al_0.5As superlattices is studied by the terahertz time-domain spectroscopy method. The structures were obtained by molecular beam epitaxy on GaAs and InP substrates with surface crystallographic orientations of (100) and (111)A. The pump-probe measurements in the transmission geometry and Hall effect measurements are used to characterize the properties of LT-InGaAs and LT-InGaAs/InAlAs structures. It is found that the terahertz radiation power is almost four times higher for LT-InGaAs samples with the (111)A substrate orientation as compared to (100). Adding of LT-InAlAs layers into the structure with (111)A substrate orientation results in two orders of magnitude increase of the structure resistivity. The possibility of creating LT-InGaAs/InAlAs-based photoconductive antennas with high dark resistance without compensating Be doping is demonstrated.

The spectrum and waveforms of broadband terahertz-radiation pulses generated by low-temperature In_0.53Ga_0.47As epitaxial films under femtosecond laser pumping are investigated by terahertz time-resolved spectroscopy. The In_0.53Ga_0.47As films are fabricated by molecular-beam epitaxy at a temperature of 200°C under different arsenic pressures on (100)-oriented InP substrates and, for the first time, on (411)A InP substrates. The surface morphology of the samples is studied by atomic-force microscopy and the structural quality is established by high-resolution X-ray diffraction analysis. It is found that the amplitude of terahertz radiation from the LT-InGaAs layers on the (411)A InP substrates exceeds that from similar layers formed on the (100) InP substrates by a factor of 3–5.

The specific features of the photoluminescence and the electrical properties of doped nanoheterostructures containing a composite InAlAs/InGaAs/InAlAs quantum well with a thin InAs insert in the...

The influence of the design of the metamorphic buffer of In0.7Al0.3As/In0.75Ga0.25As metamorphic nanoheterostructures for high-electron-mobility transistors (HEMTs) on their electrical parameters and...