We propose, fabricate, and evaluate strain-induced InGaAs/InAlAs superlattice (SL), which can efficiently radiate broadband terahertz (THz) waves. By means of optical pump-probe measurements, we demonstrate ultrashort photocarriers relaxation times of $\tau \sim 1.7\mathrm{ps}$ without Be-doping of InGaAs photoconductive layers. We assume two dominant mechanisms to be responsible for a sharp reduction of $\tau$ in strained SL, which are photocarriers scattering at InGaAs/InAlAs heterointerface roughness and the decrease in the energy bandgap of InGaAs photoconductive layers due to the residual strain. The THz time-domain spectroscopic measurements reveal the rise in both emitted THz waveform and spectrum amplitudes with an increase of the residual strain in SL, in particular, at the low-frequency region. We refer this to the band structure engineering due to the residual strain in SL—since InGaAs photoconductive layers become compressively strained, this reduces the semiconductor’s energy bandgap, thus more photocarriers can contribute to the THz emission. The results might be of specific interest for the development of portable THz pulsed spectroscopic and imaging systems and other fundamental and applied aspects of the THz science and technology.

The efficiency of the generation and detection of terahertz radiation in the range up to 3 THz by LT-GaAs films containing equidistant Si doping δ layers and grown by molecular beam epitaxy on GaAs (100) and (111)Ga substrates is studied by terahertz spectroscopy. Microstrip photoconductive antennas are fabricated on the film surface. Terahertz radiation is generated by exposure of the antenna gap to femtosecond optical laser pulses. It is shown that the intensity of terahertz radiation from the photoconductive antenna on LT-GaAs/GaAs (111)Ga is twice as large as the intensity of a similar antenna on LT-GaAs/GaAs(100) and the sensitivity of the antenna on LT-GaAs/GaAs (111)Ga as a terahertz-radiation detector exceeds that of the antenna on LT-GaAs/GaAs(100) by a factor of 1.4.

The terahertz wave generation by spiral photoconductive antennas fabricated on low-temperature In_0.5Ga_0.5As films and In_0.5Ga_0.5As/In_0.5Al_0.5As superlattices is studied by the terahertz time-domain spectroscopy method. The structures were obtained by molecular beam epitaxy on GaAs and InP substrates with surface crystallographic orientations of (100) and (111)A. The pump-probe measurements in the transmission geometry and Hall effect measurements are used to characterize the properties of LT-InGaAs and LT-InGaAs/InAlAs structures. It is found that the terahertz radiation power is almost four times higher for LT-InGaAs samples with the (111)A substrate orientation as compared to (100). Adding of LT-InAlAs layers into the structure with (111)A substrate orientation results in two orders of magnitude increase of the structure resistivity. The possibility of creating LT-InGaAs/InAlAs-based photoconductive antennas with high dark resistance without compensating Be doping is demonstrated.

The spectrum and waveforms of broadband terahertz-radiation pulses generated by low-temperature In_0.53Ga_0.47As epitaxial films under femtosecond laser pumping are investigated by terahertz time-resolved spectroscopy. The In_0.53Ga_0.47As films are fabricated by molecular-beam epitaxy at a temperature of 200°C under different arsenic pressures on (100)-oriented InP substrates and, for the first time, on (411)A InP substrates. The surface morphology of the samples is studied by atomic-force microscopy and the structural quality is established by high-resolution X-ray diffraction analysis. It is found that the amplitude of terahertz radiation from the LT-InGaAs layers on the (411)A InP substrates exceeds that from similar layers formed on the (100) InP substrates by a factor of 3–5.

The specific features of the photoluminescence and the electrical properties of doped nanoheterostructures containing a composite InAlAs/InGaAs/InAlAs quantum well with a thin InAs insert in the...