In this review, antibiotics are considered an emerging pollutant that has drawn worldwide attention in recent years. Therefore, the effective removal of antibiotic contaminants has become a hot issue in the field of environmental research. Most antibiotics applied to humans eventually enter municipal Wastewater Treatment Plants (WWTPs), because there are no appropriate commercially available pretreatment techniques. However, increasing anthropogenic activities, the high demand for animal-protein in developing countries as a nutritional alternative, and the extensive usage of antibiotics are mainly responsible for the persistence of antibiotic pollutants. One of the serious concerns regarding the presence of antibiotics in water and their potential role in exacerbating the emergence of antibiotics-resistance bacteria (ARB) and antibiotics-resistance genes (ARGs). In recent years, bioelectrochemical technologies are found promising for suppressing antibiotic contaminants through microbial metabolism and electrochemical redox reactions. Therefore, this review provides up-to-date insight research on bioelectrochemical systems (BESs), which improves the removal of the antibiotic in an efficient way. The focus of this review has been on the environmental sources of antibiotics, their health effects and possible degradation pathways, bacterial-antibiotics resistance mechanisms, and treatment of antibiotic-contained water using BES technology.

Sulfamethoxazole (SMZ), sulfathiazole (STZ) and sulfamethazine (SMT) are typical sulfonamides, which are widespread in aqueous environments and have aroused great concern in recent years. In this study, the photochemical oxidation of SMZ, STZ and SMT in their mixed solution using UV/H₂O₂ process was innovatively investigated. The result showed that the sulfonamides could be completely decomposed in the UV/H₂O₂ system, and each contaminant in the co-existence system fitted the pseudo-first-order kinetic model. The removal of sulfonamides was influenced by the initial concentration of the mixed solution, the intensity of UV light irradiation, the dosage of H₂O₂ and the initial pH of the solution. The increase of UV light intensity and H₂O₂ dosage substantially enhanced the decomposition efficiency, while a higher initial concentration of mixed solution heavily suppressed the decomposition rate. The decomposition of SMZ and SMT during the UV/H₂O₂ process was favorable under neutral and acidic conditions. Moreover, the generated intermediates of SMZ, STZ and SMT during the UV/H₂O₂ process were identified in depth, and a corresponding degradation pathway was proposed.