The paper deals with the study of the structure and properties of tantalum coatings formed by electron beam evaporation and deposition of tantalum powder on 300–450 °C aluminum substrate. The research results of surface morphology, phase and elemental composition show that high activity of an aluminum substrate and specific conditions for vapor-phase technology promote formation of tantalum coatings characterized by a high degree of crystalline grains, with high adhesion and hardness despite the surface cracks. It was observed that the optimum deposition temperature of tantalum on aluminum substrates varies from 300 °C to 350 °C. These coatings demonstrate excellent physical and mechanical properties due to formation of intermetallic phases in the reactive zone.