Structural coloration using metasurfaces has been steadily researched to overcome the limitations of conventional color printing using pigments by improving the resolution, lowering the toxicity, and increasing the durability. Many metasurfaces have been demonstrated for dynamic structural coloration to convert images at the visible spectrum. However, the previous works cannot reach near‐zero scattering when colors are turned‐off, preventing it from being cryptographic applications. Herein, we propose a completely on/off switchable structural coloration with polarization‐sensitive metasurfaces, enabling full‐colored images to be displayed and hidden through the control of the polarization of incident light. It is confirmed that the nanostructure exhibits the polarization‐dependent magnetic field distributions, and near‐zero scattering is realized when the polarization of incident light is perpendicular to the long axis of the nanofins. Also, the metasurfaces are made up of triple‐nanofin structures whose lengths affect locations of resonance peaks, resulting in full‐color spectrum coverages. With such advantages, a QR code image, a two‐color object image, and an overlapped dual‐portrait image are obtained with the metasurfaces. Such demonstrations will provide potential applications in the fields of high‐security information encryption, security tag, multichannel imaging, and dynamic displays.

Metasurfaces have shown promising potential to miniaturize existing bulk optical components thanks to their extraordinary optical properties and ultra-thin, small, and lightweight footprints. However, the absence of proper manufacturing methods has been one of the main obstacles preventing the practical application of metasurfaces and commercialization. Although a variety of fabrication techniques have been used to produce optical metasurfaces, there are still no universal scalable and high-throughput manufacturing methods that meet the criteria for large-scale metasurfaces for device/product-level applications. The fundamentals and recent progress of the large area and high-throughput manufacturing methods are discussed with practical device applications. We systematically classify various top-down scalable patterning techniques for optical metasurfaces: firstly, optical and printing methods are categorized and then their conventional and unconventional (emerging/new) techniques are discussed in detail, respectively. In the end of each section, we also introduce the recent developments of metasurfaces realized by the corresponding fabrication methods.