In this work, the plasma was used in the dielectric barrier discharge (DBD) technique for modifying the high-density polyethylene (HDPE) surface. The treatments were performed via argon or oxygen, for 10 min, at a frequency of 820 Hz, voltage of 20 kV, 2 mm distance between electrodes, and atmospheric pressure. The efficiency of the plasma was determined through the triple Langmuir probe to check if it had enough energy to promote chemical changes on the material surface. Physicochemical changes were diagnosed through surface characterization techniques such as contact angle, attenuated total reflection to Fourier transform infrared spectroscopy (ATR-FTIR), X-ray excited photoelectron spectroscopy (XPS), and atomic force microscopy (AFM). Plasma electronics temperature showed that it has enough energy to break or form chemical bonds on the material surface, impacting its wettability directly. The wettability test was performed before and after treatment through the sessile drop, using distilled water, glycerin, and dimethylformamide, to the profile of surface tensions by the Fowkes method, analyzing the contact angle variation. ATR-FTIR and XPS analyses showed that groups and bonds were altered or generated on the surface when compared with the untreated sample. The AFM showed a change in roughness, and this directly affected the increase of wettability.

AISI 5160 steel has high toughness and ductility. However, in specific applications, better tribological performance is required. In this sense, the study's objective was to perform plasma nitriding with Hastelloy's cathodic cage followed by the conventional plasma nitriding in AISI 5160 steel to produce high hardness and wear resistance. The results showed that the samples and cutting tools subjected to this process showed higher wear resistance than untreated samples and high-speed steel tools. The sample submitted to treatments with 450°C and 3 h showed greater surface hardness and less volume loss in the mechanical and machining tests. Therefore, the duplex treatment presented in this work with posterior plasma nitriding proved efficient with the low processing time.

The demand for sustainable and cost-effective materials for photovoltaic technology has led to an increasing interest in Cu₃BiS₃ thin films as potential absorber layers. This review provides a comprehensive overview of the main physical properties, synthesis methods, and theoretical studies of Cu₃BiS₃ thin films for photovoltaic applications. The high optical absorption coefficient and band gap energy around the optimal 1.4 eV make Cu₃BiS₃ orthorhombic Wittichenite-phase a promising viable alternative to conventional thin film absorber materials such as CIGS, CZTS, and CdTe. Several synthesis techniques, including sputtering, thermal evaporation, spin coating, chemical bath deposition, and spray deposition, are discussed, highlighting their impact on film quality and photovoltaic performance. Density Functional Theory studies offer insights into the electronic structure and optical properties of Cu₃BiS₃, aiding in the understanding of its potential for photovoltaic applications. Additionally, theoretical modeling of Cu3BiS3-based photovoltaic cells suggests promising efficiencies, although experimental challenges remain to be addressed. Overall, this review underscores the potential of CBS thin films as sustainable and cost-effective materials for future PV technology while also outlining the ongoing research efforts and remaining challenges in this field.