We present a novel, to the best of our knowledge, Hartmann wave front sensor for extreme ultraviolet (EUV) spectral range with a numerical aperture (NA) of 0.15. The sensor has been calibrated using an EUV radiation source based on gas high harmonic generation. The calibration, together with simulation results, shows an accuracy beyondλ/39root mean square (rms) atλ=32nm. The sensor is suitable for wave front measurement in the 10 nm to 45 nm spectral regime. This compact wave front sensor is high-vacuum compatible and designed for in situ operations, allowing wide applications for up-to-date EUV sources or high-NA EUV optics.

Ptychography, a scanning coherent diffraction imaging method, can produce a high-resolution reconstruction of a sample and, at the same time, of the illuminating beam. The emergence of vacuum ultraviolet and X-ray free electron lasers (FELs) has brought sources with unprecedented characteristics that enable X-ray ptychography with highly intense and ultra-fast short-wavelength pulses. However, the shot-to-shot pulse fluctuations typical for FEL pulses and particularly the partial spatial coherence of self-amplified spontaneous emission (SASE) FELs lead to numerical complexities in the ptychographic algorithms and ultimately restrict the application of ptychography at FELs. We present a general adaptive forward model for ptychography based on automatic differentiation, which is able to perform reconstructions even under these conditions. We applied this model to the first ptychography experiment at FLASH, the Free electron LASer in Hamburg, and obtained a high-resolution reconstruction of the sample as well as the complex wavefronts of individual FLASH pulses together with their coherence properties. This is not possible with more common ptychography algorithms.

Wavefront analysis is a fast and reliable technique for the alignment and characterization of optics in the visible, but also in the extreme ultraviolet (EUV) and X-ray regions. However, the technique poses a number of challenges when used for optical systems with numerical apertures (NA) > 0.1. A high-numerical-aperture Hartmann wavefront sensor was employed at the free electron laser FLASH for the characterization of a Schwarzschild objective. These are widely used in EUV to achieve very small foci, particularly for photolithography. For this purpose, Schwarzschild objectives require highly precise alignment. The phase measurements acquired with the wavefront sensor were analyzed employing two different methods, namely, the classical calculation of centroid positions and Fourier demodulation. Results from both approaches agree in terms of wavefront maps with negligible degree of discrepancy.

We have conceived and built the HILITE (High-Intensity Laser-Ion Trap Experiment) Penning-trap setup for the production, confinement and preparation of pure ensembles of highly charged ions in a defined quantum state as a target for various high-intensity lasers. This enables a broad suite of laser-ion interaction studies at high photon energies and/or intensities, such as non-linear photo-ionisation studies. The setup has now been used to perform experiments at one such laser facility, namely the FLASH Free-Electron Laser at DESY in Hamburg, Germany. We describe the experimental possibilities of the apparatus, the results of the first measurements and future experiments at other laser facilities.

Laser-produced Ni-like plasmas are known as active media for extreme ultraviolet lasing, with the flexibility to two-color lasing. Two-color laser generation is very complex at accelerator facilities. In this work, plasma lasing at the 3d⁹4d¹(J = 0) → 3d⁹4p¹(J = 1) (collisional-pumping process) and the 3d⁹4f¹(J = 1) → 3d⁹4d¹(J = 1) (photo-pumping process) transitions is studied experimentally and computationally. Several key characteristics of collisional- and photo-pumping laser, such as divergence, pointing stability, and intensity have been investigated. The measurements showed different pulse characteristics for the two lasing processes affected by plasma inhomogeneity in temperature and density. Analytical expressions of these characteristics for both collisional- and photo-pumping are derived. It is found that the plasma that maximizes the photo-pumping lasing is 20% hotter and 70% denser than the plasma that optimizes the collisional-pumping lasing. The gain of collisional pumping is ≈4 times higher than the gain for the photo-pumping. The gain lifetime is a factor of ≈5.2 larger for the monopole-pumping. Similarly, the gain thickness is a factor of ≈1.8 larger. It is also found that the gain build-up time for collisional- and photo-pumping is 0.7 ps and 0.9 ps, respectively, whereas the build-up length-scale is 11.5 μm and 6.3 μm, respectively.