The relationship between mobility and subthreshold swing (SS) of AlGaN/GaN HFETs was investigated at 10 and 20 V drain bias using the Monte Carlo method. We find that the polarization Coulomb field (PCF) scattering dominates the mobility at both 10 and 20 V drain bias. The channel carrier mobility is reduced as the gate bias becomes more negative, which reduces SS. The influence of mobility has not been considered in the 60 mV/dec rule, and PCF scattering is crucial for SS to be lower than 60 mV/dec in AlGaN/GaN HFETs. However, when the drain bias is 10 V, the CF scattering significantly diminishes SS. When the drain bias is 20 V, the SS barely decreases. Accordingly, a lower drain-source bias is needed to appropriately reduce SS.

A physics-based model for the output current–voltage (I–V) characteristics of AlGaN/GaN HFETs is developed based on AlGaAs/GaAs HFETs. It is demonstrated that Polarization Coulomb Field (PCF) scattering greatly influences channel electron mobility. With different gate biases, channel electron mobility is varied by PCF scattering. Furthermore, a more negative gate bias and a lower ratio of ${\mathrm{l}}_g/l_{sd}$ (gate length/source-drain space) of the device causes the PCF scattering to have stronger influence on channel electron mobility. This work is the first to apply PCF scattering to a physics-based model for AlGaN/GaN HFETs with I–V characteristics and the results indicate that PCF scattering is essential for a physics-based model to identify I–V characteristics of AlGaN/GaN HFETs.

This paper demonstrates the improvement of device linearity in AlGaN/GaN heterostructure field effect transistors (HFETs) using polarization Coulomb field (PCF) scattering and investigates the relationship between device linearity and PCF scattering under 10 and 20 V drain bias. The mobility of the gate-to-source region in AlGaN/GaN HFETs is calculated using the Monte Carlo method. We find that PCF scattering decreases with an increase in gate bias (from −3 to −0.5 V) under high field conditions, leading to lower gate-to-source resistance. Under 20 V drain bias, linearity is worse than under 10 V drain bias. The transconductance drop is significant in AlGaN/GaN HFETs, which damages linearity. By adopting an appropriate drain bias, PCF scattering can alleviate transconductance drop and improve the linearity of AlGaN/GaN HFETs.