Focused electron-beam-induced deposition from a copper precursor is shown to allow self-formation of periodic features when the beam is scanned at lateral speeds of the order of the vertical deposition rate. The period of the structures can be tuned by the scan speed. Simultaneous monitoring of the electron-beam-induced sample current and secondary electron signal shows in situ evidence of the phenomenon. The spatial distribution of scattered electrons and the influence of the structure geometry on the deposition yield are discussed. The growth rate decreases with increasing distance from the substrate. This is a growth reduction counterpart to the constant electron flow and induces the periodicity. A semi-empirical model is proposed. The study widens the understanding of the mechanism of focused electron-beam-induced deposition. This understanding will help with the future design of complex three-dimensional nanoarchitectures.

Spin-coated solid films of the gold-cluster compound Dodeca-(triphenylphosphine), hexa(chloro)pentapentacontagold Au55(PPh3)12Cl6 are irradiated with a focused 20-keV Ga+ focused-ion beam. The writing speeds on the substrate were ranging from 50 up to 2000 μm/s. This treatment locally decreases the solubility of the metalorganic precursor layer in CH2Cl2. Removal of the nonirradiated part of the surface layer with this solvent, followed by thermal decomposition of the remaining metalorganic nanostructures, leads to conducting gold lines. The width (150–360 nm) and height (20–80 nm) of these metallic lines depend on the ion dose and the original film height of the gold compound. The possible interactions leading to the fixation are briefly discussed.