Modifying the interfacial conditions of magnetic layers by capping with overlayers can efficiently enhance the magnetic functionality of a material.

In this paper, we propose a dual-fiberoptic Fabry–Perot interferometer (FFPI) sensing system integrated with a low-cost and low-coherence light-emitting diode (LED) as a light source to detect dynamic vibration caused by acoustic waves with a cut-off frequency of 200 Hz. When the acoustic signals are applied, the sensing FFPI on a Styrofoam sheet provides the function of partially transforming the longitudinal energy as the transverse energy generates a phase shift in the sensing FFPI cavity. The light reflected from the sensor is demodulated by the reference FFPI to extract the measurand. The low-power (sub-nW) optical signals are transferred into electrical signals, processed by a designed optical receiver, and recorded for data analysis.

Compound formation at a metal/semiconductor interface plays crucial roles in the properties of many material systems. Applications of Ni silicides span numerous areas and have the potential to be used as new functionalities. However, the magnetic properties of ultrathin Ni layers on silicon surfaces and related chemical compositions at the interface are not fully understood and the influence of Ag additives on the reactivity of Ni/Si(111) remain unclear. We report herein on the fact that the dominant species produced at the interface is NiSi, which is produced by the spontaneous formation of strong bonds between Ni and Si atoms. Assuming that a Ni layer is formed over a NiSi layer with the total coverage as a constraint, we established a chemical shift-related concentration model that, in effect, represents a practical method for determining the amount of ultrathin Ni silicides that are produced at the buried interface. The formation of Ag-Si particles provide a viable strategy for enhancing silicide formation via a specific interaction transfer mechanism, even at room temperature. The mechanism is related to differences in the enthalpies of formation ΔH_Ag-Si, ΔH_Ni-Ag, and ΔH_Ni-Si, for these phases and provides insights into strategies for producing ultrathin silicides at a buried interface.

This work primarily focuses on the degradation degree of bulk current (I_B) for 28 nm stacked high-k (HK) n-channel metal–oxide–semiconductor field-effect transistors (MOSFETs), sensed and stressed with the channel-hot-carrier test and the drain-avalanche-hot-carrier test, and uses a lifetime model to extract the lifetime of the tested devices. The results show that when I_B reaches its maximum, the ratio of V_GS/V_DS values at this point, in the meanwhile, gradually increases in the tested devices from the long-channel to the short ones, not just located at one-third to one half. The possible ratiocination is due to the ON-current (I_DS), in which the short-channel devices provide larger I_DS impacting the drain junction and generating more hole carriers at the surface channel near the drain site. In addition, the decrease in I_B after hot-carrier stress is not only the increment in threshold voltage V_T inducing the decrease in I_DS, but also the increment in the recombination rate due to the mechanism of diffusion current. Ultimately, the device lifetime uses Berkley’s model to extract the slope parameter m of the lifetime model. Previous studies have reported m-values ranging from 2.9 to 3.3, but in this case, approximately 1.1. This possibly means that the critical energy of the generated interface state becomes smaller, as is the barrier height of the HK dielectric to the conventional silicon dioxide as the gate oxide.

In this study, we demonstrate inverted PTB7:PC₇₁BM polymer solar cells featuring a solution-processed s-MoO₃ hole transport layer that can, after thermal aging at 85 °C, retain their initial power conversion efficiency for at least 2200 h.