The evolution of internal compressive stress from the intermetallic compound (IMC) Cu₆Sn₅ growth is commonly acknowledged as the key inducement initiating the nucleation and growth of tin (Sn) whisker. This study investigates the effect of Sn-0.7Cu-0.05Ni on the nucleation and growth of Sn whisker under continuous mechanical stress induced. The Sn-0.7Cu-0.05Ni solder joint has a noticeable effect of suppression by diminishing the susceptibility of nucleation and growth of Sn whisker. By using a synchrotron micro X-ray fluorescence (µ-XRF) spectroscopy, it was found that a small amount of Ni alters the microstructure of Cu₆Sn₅ to form a (Cu,Ni)₆Sn₅ intermetallic layer. The morphology structure of the (Cu,Ni)₆Sn₅ interfacial intermetallic layer and Sn whisker growth were investigated by scanning electron microscope (SEM) in secondary and backscattered electron imaging mode, which showed that there is a strong correlation between the formation of Sn whisker and the composition of solder alloy. The thickness of the (Cu,Ni)₆Sn₅ IMC interfacial layer was relatively thinner and more refined, with a continuous fine scallop-shaped IMC interfacial layer, and consequently enhanced a greater incubation period for the nucleation and growth of the Sn whisker. These verification outcomes proposes a scientifically foundation to mitigate Sn whisker growth in lead-free solder joint.

This paper presents an assessment of the effect of isothermal annealing of Sn whisker growth behavior on the surface of Sn0.7Cu0.05Ni solder joints using the hot-dip soldering technique. Sn0.7Cu and Sn0.7Cu0.05Ni solder joints with a similar solder coating thickness was aged up to 600 h in room temperature and annealed under 50 °C and 105 °C conditions. Through the observations, the significant outcome was the suppressing effect of Sn0.7Cu0.05Ni on Sn whisker growth in terms of density and length reduction. The fast atomic diffusion of isothermal annealing consequently reduced the stress gradient of Sn whisker growth on the Sn0.7Cu0.05Ni solder joint. It was also established that the smaller (Cu,Ni)₆Sn₅ grain size and stability characteristic of hexagonal η-Cu₆Sn₅ considerably contribute to the residual stress diminished in the (Cu,Ni)₆Sn₅ IMC interfacial layer and are able to suppress the growth of Sn whiskers on the Sn0.7Cu0.05Ni solder joint. The findings of this study provide environmental acceptance with the aim of suppressing Sn whisker growth and upsurging the reliability of the Sn0.7Cu0.05Ni solder joint at the electronic-device-operation temperature.

Cobalt-hydroxyapatite (Co-HA) composites was successfully prepared by simple electroless deposition process of Co on the surface of hydroxyapatite (HA) particles. Co deposition was carried out in an alkaline bath with sodium hypophosphite as a reducing agent. The electroless process was carried out without sensitization and activation steps. The deposition of Co onto HA was characterized by scanning electron microscopy (SEM) and energy-dispersive X-ray spectroscopy (EDX). The Co-HA composite powder was compacted and sintered at 1250°C. The Co particles were homogeneously dispersed in the HA matrix after sintering and the mechanical properties of composites was enhanced to 100 % with 3 % wt Co and gradually decreased at higher Co content.

Due to the transition of the electronics industry to lead-free solders, the issue of tin (Sn) whisker has become one of the most imperative issues that need to be resolved. Moreover, with the increasing demand for electronics miniaturization, Sn whisker growth is a severe threat to the reliability of microelectronic devices. Sn whisker is a conductive tin structure that grows spontaneously from tin finished surfaces, which can lead to well-documented system failures in electronics industries. Assessment of the Sn whisker growth is difficult because of the slow and unpredictable nature of the Sn whisker formation. This paper presents the results of morphology analysis of Sn whisker growth in terms of Sn whiskers shape, average density and maximum length of Sn whisker on Sn-Cu solder finished using scanning electron microscope (SEM). Micro-indentation test was used to accelerate the growth of Sn whisker at room temperature storage.

Electroplated tin (Sn)Limeited finishes are widely used in the electronics industry due to their excellent solderability, electrical conductivity and corrosion resistance. However, since prohibiting the use of lead (Pb) in electronics, the issue of tin (Sn) whisker has become one of the most imperative issues that need to be resolved. Moreover, with the increasing demand for electronics miniaturization, Sn whisker growth is a severe threat to the reliability of microelectronic device. This paper investigates the effect of electroplating current density (10, 30 and 50 mA/cm²) on whisker growth at room temperature. A simple micro- indentation test was used to accelerate continuously the growth of Sn whisker at room temperature storage for 24 h. Morphology analysis of Sn whisker growth was done using scanning electron microscope (SEM) and image-J Software. Axial length of the Sn whisker was calculated by using JEDEC Standards (JESD22-A121A).

It has been widely confirmed that alloying significantly can mitigate the formation of tin (Sn) whiskers and consequently became a possible candidate as a lead-free alloys coating material in the microelectronics industry. In this study, the effect of 0.05 wt.% Ni addition on the formation and growth of Sn whisker in Sn-0.7Cu solder coatings have been investigated under continuous mechanically stress induced at room temperature. It is clearly found that Ni addition have significantly enhanced stress relaxation by reducing the growth rate of formation Sn whiskers in Sn-0.7Cu solder coatings. The morphology of (Cu,Ni)6Sn5 interfacial IMC was more refine and thinner with a fine scallop-shaped interfacial intermetallic layer purposely to lower the compressive stress of Sn coating and extend the nucleation period, thus mitigating the formation and growth of Sn whiskers.