Barbara Putz

Dr. Barbara Putz

EMPA: Swiss Federal Laboratories for Materials Science and Technology, Switzerland

Research Focus & Metrics

Academic Career Length

11Years (2016-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

View All Publications
15 October 2020 in Nanoscale
Verified
Journal Article
Closed access
PDF file
BSBaran Sarac
Baran Sarac
TKTolga Karazehir
Tolga Karazehir
YIYurii P. Ivanov
Yurii P. Ivanov
Barbara PutzBarbara Putz
Barbara Putz
AGA. Lindsay Greer
A. Lindsay Greer
JEJürgen Eckert
Jürgen Eckert
Compared to conventional polycrystalline Pd, Pd79Au9Si12 metallic glass nanofilm electrocatalyst offers better methanol oxidation in alkaline medium, CO poisoning tolerance and catalyst stability even at high scan rates or high methanol concentrations.

12 June 2023 in Materials & Design
Verified
Journal Article
Open access
Barbara PutzBarbara Putz
Barbara Putz
TEThomas E.J. Edwards
Thomas E.J. Edwards
EHEmese Huszar
Emese Huszar
LPLaszlo Pethö
Laszlo Pethö
PKPatrice Kreiml
Patrice Kreiml
JMJohann Michler
Johann Michler

1 April 2020 in Thin Solid Films
Verified
Journal Article
Closed access
Oleksandr GlushkoOleksandr Glushko
Oleksandr Glushko
Barbara PutzBarbara Putz
Barbara Putz
MCMegan Cordill
Megan Cordill

1 August 2020 in Materials & Design
Verified
Journal Article
Open access
RSRachel Schoeppner
Rachel Schoeppner
CFCalum Ferguson
Calum Ferguson
LPLaszlo Pethö
Laszlo Pethö
CGCarlos Guerra-Nuñez
Carlos Guerra-Nuñez
ATAidan A. Taylor
Aidan A. Taylor
JMJohann Michler
Johann Michler

1 February 2016 in MRS Advances
Verified
Journal Article
Closed access
PDF file
Barbara PutzBarbara Putz
Barbara Putz
Oleksandr GlushkoOleksandr Glushko
Oleksandr Glushko
VMVera M. Marx
Vera M. Marx
CKChristoph Kirchlechner
Christoph Kirchlechner
DTDaniel Toebbens
Daniel Toebbens
MCMegan J. Cordill
Megan J. Cordill

23 November 2022 in Advanced Engineering Materials
Verified
Journal Article
Open access
Barbara PutzBarbara Putz
Barbara Putz
TEThomas E.J. Edwards
Thomas E.J. Edwards
EHEmese Huszar
Emese Huszar
PGPatric A. Gruber
Patric A. Gruber
KGKevin‐P. Gradwohl
Kevin‐P. Gradwohl
JMJohann Michler
Johann Michler
A series of Al and Al/Al2O3 thin‐film multilayer structures on flexible polymer substrates are fabricated with a unique deposition chamber combining magnetron sputtering (Al) and atomic layer deposition (ALD, Al2O3, nominal thickness 2.4–9.4 nm) without breaking vacuum and thoroughly characterized using transmission electron microscopy (TEM). The electromechanical behavior of the multilayers and Al reference films is investigated in tension with in situ X‐ray diffraction (XRD) and four‐point probe resistance measurements. All films exhibit excellent interfacial adhesion, with no delamination in the investigated strain range (12%). For the first time, an adhesion‐promoting naturally forming amorphous interlayer is confirmed for thin films sputter deposited onto polymers under laboratory conditions. The evolution of Al film stresses and electrical resistance reveal changes in the deformation behavior as a function of oxide thickness. Strengthening of Al is observed with increasing oxide thickness. Significant embrittlement can be avoided for oxide layer thicknesses ≤2.4 nm.