A robust paintlike repellent coating: Superhydrophobic materials often depend on a particular surface patterning or an applied coating. However, these surfaces can be damaged by wear or fouled by oily materials. Lu et al. devised a suspension of coated titanium dioxide nanoparticles that can be spray-painted or dipcoated onto a range of hard and soft surfaces, including paper, cloth, and glass. The coatings resisted rubbing, scratching, and surface contamination. Science , this issue p. 1132

Liquid-repellent surfaces, such as superhydrophobic surfaces, superoleophobic surfaces, and slippery liquid-infused surfaces, have drawn keen research interest from the communities engaged in chemical synthesis, interfacial chemistry, surface engineering, bionic manufacturing and micro-nano machining. This is due to their great potential applications in liquid-proofing, self-cleaning, chemical resistance, anti-icing, water/oil remediation, biomedicine, etc. However, poor robustness and durability that notably hinders the real-world applications of such surfaces remains their Achilles heel. The past few years have witnessed rapidly increasing publications that address the robustness and durability of liquid-repellent surfaces, and many breakthroughs have been achieved. This review provides an overview of the recent progress made towards robust and durable liquid-repellent surfaces. First, we discuss the wetting of solid surface and its generally-adopted characterisation methods, and introduce typical liquid-repellent surfaces. Second, we focus on various evaluation methods of the robustness and durability of liquid-repellent surfaces. Third, the recent advances in design and fabrication of robust and durable liquid-repellent surfaces are reviewed in detail. Fourth, we present the applications where these surfaces have been employed in fields like chemistry, engineering, biology and in daily life. Finally, we discuss the possible research perspectives in robust and durable liquid-repellent surfaces. By presenting such state-of-the-art of this significant and fast-developing area, we believe that this review will inspire multidisciplinary scientific communities and industrial circles to develop novel liquid-repellent surfaces that can meet the requirements of various real-world applications.

This article focuses on n-type doped transparent conducting binary oxides – namely, those with the general formula M_xO_y:D, where M_xO_y is the host oxide material and D is the dopant element. Such materials are of great industrial importance in modern materials chemistry. In particular, there is a focus on the search for alternatives to indium-based materials, prompted by indium's problematic supply risk as well as a number of functional factors. The important relationship between computational study and experimental observation is explored, and an extensive comparison is made between the electrical properties of a number of the most interesting experimentally-prepared materials. In writing this article, we aim to provide both an accessible tutorial of the physical descriptions of transparent conducting oxides, and an up-to-date overview of the field, with a brief history, some key accomplishments from the past few decades, the current state of the field as well as postulation on some likely future developments.

We report the synthesis and photoelectrochemical assessment of phase pure tetragonal matlockite structured BiOX (where X = Cl, Br, I) films. The materials were deposited using aerosol-assisted chemical vapour deposition. The measured optical bandgaps of the oxyhalides, supported by density functional theory calculations, showed a red shift with the increasing size of halide following the binding energy of the anion p-orbitals that form the valence band. Stability and photoelectrochemical studies carried out without a sacrificial electron donor showed the n-type BiOBr film to have the highest photocurrent reported for BiOBr in the literature to date (0.3 mA cm⁻² at 1.23 V vs. RHE), indicating it is an excellent candidate for solar fuel production with a very low onset potential of 0.2 V vs. RHE. The high performance was attributed to the preferred growth of the film in the [011] direction, as shown by X-ray diffraction, leading to internal electric fields that minimize charge carrier recombination.

The production of thin films of materials has become the attention of a great deal of research throughout academia and industry worldwide owing to the array of applications which utilise them, including electronic devices, gas sensors, solar cells, window coatings and catalytic systems. Whilst a number of deposition techniques are in common use, chemical vapour deposition (CVD) is an attractive process for the production of a wide range of materials due to the control it offers over film composition, coverage and uniformity, even on large scales. Conventional CVD processes can be limited, however, by the need for suitably volatile precursors. Aerosol-assisted (AA)CVD is a solution-based process which relies on the solubility of the precursor, rather than its volatility and thus vastly extends the range of potentially applicable precursors. In addition, AACVD offers extra means to control film morphology and concurrently the properties of the deposited materials. In this perspective we discuss the AACVD process, the influence of deposition conditions on film characteristics and a number of materials and applications to which AACVD has been found beneficial.