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This paper presents current research trends and prospects of utilizing additive manufacturing (AM) techniques to manufacture electrical machines. Modern-day machine applications require extraordinary performance parameters such as high power-density, integrated functionalities, improved thermal, mechanical & electromagnetic properties. AM offers a higher degree of design flexibility to achieve these performance parameters, which is impossible to realize through conventional manufacturing techniques. AM has a lot to offer in every aspect of machine fabrication, such that from size/weight reduction to the realization of complex geometric designs. However, some practical limitations of existing AM techniques restrict their utilization in large scale production industry. The introduction of three-dimensional asymmetry in machine design is an aspect that can be exploited most with the prevalent level of research in AM. In order to take one step further towards the enablement of large-scale production of AM-built electrical machines, this paper also discusses some machine types which can best utilize existing developments in the field of AM.
Muhammad Naseer; Ants Kallaste; Bilal Asad; Toomas Vaimann; Anton Rassõlkin. A Review on Additive Manufacturing Possibilities for Electrical Machines. Energies 2021, 14, 1940 .
AMA StyleMuhammad Naseer, Ants Kallaste, Bilal Asad, Toomas Vaimann, Anton Rassõlkin. A Review on Additive Manufacturing Possibilities for Electrical Machines. Energies. 2021; 14 (7):1940.
Chicago/Turabian StyleMuhammad Naseer; Ants Kallaste; Bilal Asad; Toomas Vaimann; Anton Rassõlkin. 2021. "A Review on Additive Manufacturing Possibilities for Electrical Machines." Energies 14, no. 7: 1940.
M. Usman Naseer; F. Deeba; S. I. W. Shah; S. Hussain; A. Qayyum. Temporal Profiling of Electron Temperatures Using the Hα–Hβ Line Emission and Triple Langmuir Probe Array in the Pre-Ionization Discharge of the MT-I Spherical Tokamak. Fusion Science and Technology 2020, 76, 947 -956.
AMA StyleM. Usman Naseer, F. Deeba, S. I. W. Shah, S. Hussain, A. Qayyum. Temporal Profiling of Electron Temperatures Using the Hα–Hβ Line Emission and Triple Langmuir Probe Array in the Pre-Ionization Discharge of the MT-I Spherical Tokamak. Fusion Science and Technology. 2020; 76 (8):947-956.
Chicago/Turabian StyleM. Usman Naseer; F. Deeba; S. I. W. Shah; S. Hussain; A. Qayyum. 2020. "Temporal Profiling of Electron Temperatures Using the Hα–Hβ Line Emission and Triple Langmuir Probe Array in the Pre-Ionization Discharge of the MT-I Spherical Tokamak." Fusion Science and Technology 76, no. 8: 947-956.
During the wall conditioning of the MT-I spherical tokamak, the addition of nitrogen impurity in the argon and helium microwave discharges has been investigated using the optical actinometric technique. This simple technique exploits the change in emission intensity of the selected Ar/He lines at constant partial pressure to normalize the electron energy distribution function with changing plasma conditions provided that both transitions have close excitation thresholds and similar dependence of excitation cross-sections. Accordingly, the selected line intensity of the nitrogen can be related to the ground state concentration of the nitrogen molecules and ions involving in optical emission. The electron temperature for both discharges has been determined separately from the Boltzmann plot method. For measurement of electron number density empirical formulas have been derived from the isolated spectral lines of Ar–I (750.38 nm) and He–I (587.56 nm & 667.81 nm). Stark broadening of well-isolated argon Ar–I (750.38 nm) and helium He–I (587.56 nm & 667.81 nm) lines have been used after de-convolution of other broadening contributions. It is observed that the electron temperature reduces with time indicating the plasma cooling with the addition of nitrogen impurity in the chamber.
Farah Deeba; A. Qayyum; M.U. Naseer; S. Hussain. Optical actinometric measurements of nitrogen impurity in Ar/He microwave discharge during wall cleaning of MT-I spherical tokamak. Vacuum 2020, 182, 109672 .
AMA StyleFarah Deeba, A. Qayyum, M.U. Naseer, S. Hussain. Optical actinometric measurements of nitrogen impurity in Ar/He microwave discharge during wall cleaning of MT-I spherical tokamak. Vacuum. 2020; 182 ():109672.
Chicago/Turabian StyleFarah Deeba; A. Qayyum; M.U. Naseer; S. Hussain. 2020. "Optical actinometric measurements of nitrogen impurity in Ar/He microwave discharge during wall cleaning of MT-I spherical tokamak." Vacuum 182, no. : 109672.
Active screen plasma nitriding (ASPN) of steel has been extensively studied during the past few years. ASPN is a new technique with many advantages and can be used for treating non-electrical conducting materials like oxides and polymers. Recently, ASPN technique has been used for aluminum and aluminum alloys for surface treatment. The current study reports the growth and characterization of the compound aluminum and iron nitride coating on aluminum–silicon (Al–11Si) eutectic alloy using the active screen plasma nitriding setup to improve the surface properties of the alloy. After treatment in low-pressure plasma environment for five-hours, samples were characterized using X-ray diffraction (XRD), scanning electron microscopy (SEM) with energy dispersive spectroscopy (EDS), atomic force microscopy, and Vickers's Micro Hardness testing to investigate the changes in surface morphology, elemental composition, and mechanical properties before and after the plasma treatment. XRD peaks (111), (200), (220), (311) of AlN were observed while that of FeXN peaks were also observed. Spherical, highly crystalline, agglomerated aluminum, and iron nitrides were observed in SEM micrographs. Elemental analysis using EDS and laser-induced breakdown spectroscopy confirmed the presence of nitrogen at the surface of the low pressure plasma treated sample. The presence of nitrides on the surface of the alloy resulted in improvement of the hardness as observed from the Vickers' hardness testing. It is concluded that ASPN is a useful technique for the improvement of surface hardness of Al–11Si alloy.
Muhammad Bilal; Abdul Qayyum; Zahoor Ahmad; Kamran Ahmad; Muhammad Usman Naseer; Atta Ullah Shah; Arshad Mahmood; Mian Munib Ur Rehman; Shahid Hussain. Active screen plasma nitriding of Al–Si eutectic alloy and evaluation of compound coatings. Applied Physics A 2020, 126, 1 -8.
AMA StyleMuhammad Bilal, Abdul Qayyum, Zahoor Ahmad, Kamran Ahmad, Muhammad Usman Naseer, Atta Ullah Shah, Arshad Mahmood, Mian Munib Ur Rehman, Shahid Hussain. Active screen plasma nitriding of Al–Si eutectic alloy and evaluation of compound coatings. Applied Physics A. 2020; 126 (3):1-8.
Chicago/Turabian StyleMuhammad Bilal; Abdul Qayyum; Zahoor Ahmad; Kamran Ahmad; Muhammad Usman Naseer; Atta Ullah Shah; Arshad Mahmood; Mian Munib Ur Rehman; Shahid Hussain. 2020. "Active screen plasma nitriding of Al–Si eutectic alloy and evaluation of compound coatings." Applied Physics A 126, no. 3: 1-8.