Flexible transparent electrodes (FTEs) are widely used in a variety of applications, including flexible displays and wearable devices. Important factors in FTE design include active control of electrical sheet resistance, optical transparency and mechanical flexibility. Because these factors are inversely proportional to one another, it is essential to develop a technique that maintains flexibility while actively controlling the sheet resistance and transparency for a variety of applications. This research presents a new method for fabricating transparent electrodes on flexible polyimide films using electrospinning and copper electroless deposition methods. A flat metal network-based electrode without contact resistance was fabricated by heat treatment and electroless deposition onto the electrospun seed layer. The fabricated FTEs exhibited a transparency exceeding 80% over the entire visible light range and a sheet resistance of less than 10.0 Ω sq⁻¹. Due to the heat treatment process, the adhesion between the metal network and the substrate was superior to other electrospinning-based transparent electrodes. Applicable to the large-area manufacturing process, the standard deviation of the network density of the fabricated large-area FTE was about 1%. This study does not require the polymer casting technique and has further advantages for mass production of electrodes and application to various fields.

We developed a novel fabrication method for nanochannels that are easily scaled up to mass production by selectively growing zinc oxide (ZnO) nanostructures and covering using a flat PDMS surface to make hollow nanochannels. Nanochannels are used in the biotechnological and environmental fields, being employed for DNA analysis and water purification, due to their unique features of capillary-induced negative pressure and an electrical double-layer overlap. However, existing nanochannel fabrication methods are complicated, costly, and not amenable to mass production. Here, we developed a novel nanochannel fabrication method. The pillar-like dense ZnO nanostructures were grown in a solution process, which is easily applicable to mass production. The size of the fabricated ZnO nanostructures has a thickness of 30–300 nm and a diameter on the order of 10² nm, which are easily adjusted by synthesis times. The ZnO nanostructures were covered by the flat polydimethylsiloxane (PDMS) surface, and then the cracks between ZnO nanostructures served as hollow nanochannels. Because the suggested fabrication process has no thermal shrinkage, the process has higher production efficiency than existing nanochannel mass production methods based on the thermal/pressure process. The mechanical strength of the fabricated ZnO nanostructures was tested with repetitive tape peeling tests. Finally, we briefly verified the nanochannel performance by applying the nanochannel to the micro/nanofluidic system, whose performance is easily evaluated and visualized by current–voltage relation.

Oblique submicron-scale structures are used in various aspects of research, such as the directional characteristics of dry adhesives and wettability. Although deposition, etching, and lithography techniques are applied to fabricate oblique submicron-scale structures, these approaches have the problem of the controllability or throughput of the structures. Here, we propose a simple X-ray-lithography method, which can control the oblique angle of submicron-scale structures with areas on the centimeter scale. An X-ray mask was fabricated by gold film deposition on slanted structures. Using this mask, oblique ZEP520A photoresist structures with slopes of 20° and 10° and widths of 510 nm and 345 nm were fabricated by oblique X-ray exposure, and the possibility of polydimethylsiloxane (PDMS) molding was also confirmed. In addition, through double exposure with submicron- and micron-scale X-ray masks, dotted-line patterns were produced as an example of multiscale patterning.