Shubham Tayal

Dr. Shubham Tayal

orcid

Research Focus & Metrics

Academic Career Length

10Years (2017-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

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1 August 2021 in Microelectronics Journal
Verified
Journal Article
Closed access
JAJ. Ajayan
J. Ajayan
DND. Nirmal
D. Nirmal
STShubham Tayal
Shubham Tayal
SBSANDIP BHATTACHARYA
SANDIP BHATTACHARYA
LAL. Arivazhagan
L. Arivazhagan
DAD. Ajitha
D. Ajitha

1 October 2021 in Microelectronics Journal
Verified
Journal Article
Closed access
SRShiromani Balmukund Rahi
Shiromani Balmukund Rahi
STShubham Tayal
Shubham Tayal
AUAbhishek Kumar Upadhyay
Abhishek Kumar Upadhyay

1 December 2017 in Superlattices and Microstructures
Verified
Journal Article
Closed access
STShubham Tayal
Shubham Tayal
ANAshutosh Nandi
Ashutosh Nandi

4 November 2022 in IEEE Transactions on Electron Devices
Verified
Journal Article
Closed access
SVSresta Valasa
Sresta Valasa
STShubham Tayal
Shubham Tayal
LTLaxman Raju Thoutam
Laxman Raju Thoutam
This manuscript for the first time presents the digital and analog/RF performance analysis for novel Tree-shaped Junctionless Nanosheet (NS) FET. An additional inter-bridge (IB) channel is added to the vertically stacked JL-NSFET to form a Tree-shaped structure. The Tree-shaped JL-NSFET is compared with the conventional JL-NSFET for $\textit{L}_{\textit{g}}$ $=$ 16 nm, $\textit{T}_{\text{NS}}$ $=$ 5 nm, $\textit{W}_{\text{NS}}$ $=$ 18 nm, $\textit{W}_{\text{IB}}$ $=$ 2 nm, and $\textit{H}_{\text{IB}}$ $=$ 6 nm. It is observed that ON-current ( $\textit{I}_{\biosc{on}}$ ) has been improved for Tree-shaped JL-NSFET by an amount of $\sim$ 15.3% with a decent subthreshold swing of 61.5 mV/dec. The analog/RF performance of the Tree-shaped JL-NSFET has been improved satisfactorily as compared to the conventional JL-NSFET. Further to enhance the digital/analog RF performance the $\textit{W}_{\text{IB}}$ is varied between 2–4 nm. The $\textit{I}_{\biosc{on}}$ is increased by an amount of $\sim$ 23.56% with the increase in $\textit{W}_{\text{IB}}$ due to the increase in effective width. However, the same resulted in the degradation of $\textit{A}_{\textit{V}}$ , GFP, $\textit{f}_{\textit{T}}$ , and $\textit{f}_{\text{MAX}}$ by an amount of $\sim$ 1.72%, $\sim$ 3.39%, $\sim$ 4.46%, and $\sim$ 8.39%, respectively, at 1-nA normalized drain current. Hence lower $\textit{W}_{\text{IB}}$ must be chosen for the improvement of analog/RF parameters. Furthermore, the effect of temperature (100–400 K) on Tree-shaped JL-NSFET is also investigated and the performance is best recorded at lower temperatures. At 1-nA normalized drain current, $\textit{g}_{\textit{m}}$ , $\textit{A}_{\textit{V}}$ , $\textit{f}_{\textit{T}}$ , $\textit{f}_{\text{MAX}}$ , and GFP are noticeably improved by an amount of $\sim$ 68.6%, $\sim$ 5.84%, $\sim$ 65.02%, $\sim$ 34.14%, and $\sim$ 56.02%, respectively. Moreover, the effect of IB height ( $\textit{H}_{\text{IB}}$ ) is explored (6–14 nm) and it is inferred that $\textit{H}_{\text{IB}}$ should be optimized to get better digital and analog/RF performances according to the application areas.

1 June 2018 in Materials Science in Semiconductor Processing
Verified
Journal Article
Closed access
STShubham Tayal
Shubham Tayal
ANAshutosh Nandi
Ashutosh Nandi

4 May 2021 in Silicon
Verified
Journal Article
Closed access
PDF file
STShubham Tayal
Shubham Tayal
JAJ. AJAYAN
J. AJAYAN
LJL. M. I. Leo Joseph
L. M. I. Leo Joseph
JTJ. Tarunkumar
J. Tarunkumar
DND. Nirmal
D. Nirmal
ANAshutosh Nandi
Ashutosh Nandi