David Nečas

Dr. David Nečas

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Research Focus & Metrics

Academic Career Length

21Years (2006-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

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3 December 2011 in Open Physics
Verified
Journal Article
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DNDavid Nečas
David Nečas
PKPetr Klapetek
Petr Klapetek
In this article, we review special features of Gwyddion—a modular, multiplatform, open-source software for scanning probe microscopy data processing, which is available at http://gwyddion.net/. We describe its architecture with emphasis on modularity and easy integration of the provided algorithms into other software. Special functionalities, such as data processing from non-rectangular areas, grain and particle analysis, and metrology support are discussed as well. It is shown that on the basis of open-source software development, a fully functional software package can be created that covers the needs of a large part of the scanning probe microscopy user community.

30 August 2011 in Discover Nano
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Journal Article
Open access
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PKPetr Klapetek
Petr Klapetek
MVMiroslav Valtr
Miroslav Valtr
DNDavid Nečas
David Nečas
OSOta Salyk
Ota Salyk
PDPetr Dzik
Petr Dzik
Nanoparticles are often measured using atomic force microscopy or other scanning probe microscopy methods. For isolated nanoparticles on flat substrates, this is a relatively easy task. However, in real situations, we often need to analyze nanoparticles on rough substrates or nanoparticles that are not isolated. In this article, we present a simple model for realistic simulations of nanoparticle deposition and we employ this model for modeling nanoparticles on rough substrates. Different modeling conditions (coverage, relaxation after deposition) and convolution with different tip shapes are used to obtain a wide spectrum of virtual AFM nanoparticle images similar to those known from practice. Statistical parameters of nanoparticles are then analyzed using different data processing algorithms in order to show their systematic errors and to estimate uncertainties for atomic force microscopy analysis of nanoparticles under non-ideal conditions. It is shown that the elimination of user influence on the data processing algorithm is a key step for obtaining accurate results while analyzing nanoparticles measured in non-ideal conditions.

27 March 2014 in Plasma Processes and Polymers
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Journal Article
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Anton ManakhovAnton Manakhov
Anton Manakhov
Lenka ZajickovaLenka Zajickova
Lenka Zajickova
MEMarek Eliáš
Marek Eliáš
JČJan Čechal
Jan Čechal
JPJosef Polcak
Josef Polcak
DNDavid Nečas
David Nečas

1 January 2013 in Ultramicroscopy
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Journal Article
Closed access
DNDavid Nečas
David Nečas
PKPetr Klapetek
Petr Klapetek

17 September 2020 in Scientific Reports
Verified
Journal Article
Open access
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DNDavid Nečas
David Nečas
MVMiroslav Valtr
Miroslav Valtr
PKPetr Klapetek
Petr Klapetek
Surface roughness plays an important role in various fields of nanoscience and nanotechnology. However, the present practices in roughness measurements, typically based on some Atomic Force Microscopy measurements for nanometric roughness or optical or mechanical profilometry for larger scale roughness significantly bias the results. Such biased values are present in nearly all the papers dealing with surface parameters, in the areas of nanotechnology, thin films or material science. Surface roughness, most typically root mean square value of irregularities Sq is often used parameter that is used to control the technologies or to link the surface properties with other material functionality. The error in estimated values depends on the ratio between scan size and roughness correlation length and on the way how the data are processed and can easily be larger than 10% without us noting anything suspicious. Here we present a survey of how large is the problem, detailed analysis of its nature and suggest methods to predict the error in roughness measurements and possibly to correct them. We also present a guidance for choosing suitable scan area during the measurement.

1 January 2007 in Optics Express
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Journal Article
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DFDaniel Franta
Daniel Franta
DNDavid Nečas
David Nečas
Lenka ZajickovaLenka Zajickova
Lenka Zajickova
Two dispersion models of disordered solids, one parameterizing density of states (PDOS) and the other parameterizing joint density of states (PJDOS), are presented. Using these models, not only the complex dielectric function of the materials, but also some information about their electronic structure can be obtained. The numerical integration is necessary in the PDOS model. If analytical expressions are required the presented PJDOS model is, for some materials, a suitable option still providing information about the electronic structure of the material. It is demonstrated that the PDOS model can be successfully applied to a wide variety of materials. In this paper, its application to diamond-like carbon (DLC), a-Si and SiO2-like materials are discussed in detail. Unlike the PDOS model, the presented PJDOS model represents a special case of parameterization that can be applied to limited types of materials, for example DLC, ultrananocrystalline diamond (UNCD) and SiO2-like.