Contributions of morphology, surface area, and defect content, on the photocatalytic activity of ZnO nanostructures have been discussed.

Physicochemical analysis was carried out to obtain the species distribution diagrams (SDDs) for the deposition of ZnO films as a function of OH ⁻ ion concentration ([OH ⁻ ]) in the reaction solution.

Tantalum-doped ZnO structures (ZnO:Ta) were synthesized, and some of their characteristics were studied. ZnO material was deposited on silicon substrates by using a hot filament chemical vapor deposition (HFCVD) reactor. The raw materials were a pellet made of a mixture of ZnO and Ta₂O₅ powders, and molecular hydrogen was used as a reactant gas. The percentage of tantalum varied from 0 to 500 mg by varying the percentages of tantalum oxide in the mixture of the pellet source, by holding a fixed amount of 500 mg of ZnO in all experiments. X-ray diffractograms confirmed the presence of zinc oxide in the wurtzite phase, and metallic zinc with a hexagonal structure, and no other phase was detected. Displacements to lower angles of reflection peaks, compared with those from samples without doping, were interpreted as the inclusion of the Ta atoms in the matrix of the ZnO. This fact was confirmed by energy dispersive X-ray spectrometry (EDS), and X-ray diffraction (XRD) measurements. From scanning electron microscopy (SEM) images from undoped samples, mostly micro-sized semi-spherical structures were seen, while doped samples displayed a trend to grow as nanocrystalline rods. The presence of tantalum during the synthesis affected the growth direction. Green photoluminescence was observed by the naked eye when Ta-doped samples were illuminated by ultraviolet radiation and confirmed by photoluminescence (PL) spectra. The PL intensity on the Ta-doped ZnO increased from those undoped samples up to eight times.

Orthorhombic tin sulfide (SnS) thin films have been deposited on stainless steel (SS) substrates by Chemical Bath Deposition (CBD) at 25, 35 and 70 °C with a deposit time of 8 hours each one. XRD analysis showed that samples obtained at 25 °C and 70 °C present very small diffraction peaks. This can be attributed in the case of the sample obtained at 25 degrees, that the crystallization process is not completed because the temperature is so low and in case of the sample deposited at 75 degrees, a redissolution of the material is carried out. However, sample obtained at 35 °C was polycrystalline with orthorhombic structure and preference plane (111). All samples showed the Raman vibrational modes TO and LO of the SnS and confirms that the samples do not have by-products. It was observed from SEM micrographs that the films consisted of spheres for the sample deposited at 25 °Candsmall flakes for the other samples. From diffuse reflectance measurements the optical band gap calculated was between 1.45 eV to 1.59 eV.