Advanced oxidation processes (AOPs) have emerged as a promising approach for the removal of organic dyes from effluents. Different AOPs were employed for the degradation of Reactive Yellow 160A (RY-160A) dye, i.e., SnO2/UV/H2O2 and TiO2/UV/H2O2. In the case of UV treatment, maximum degradation of 28% was observed, while UV/H2O2 furnished 77.78% degradation, and UV/H2O2/TiO2 degraded the RY-160A dye up to 90.40% (RY-160A 30 mg/L, 0.8 mL of H2O2). The dye degradation was 82.66% in the case of UV/H2O2/SnO2 at pH 3. FTIR and LC-MS analyses were performed in order to monitor the degradation by-products. The cytotoxicity and mutagenicity of RY-160A dye were evaluated by hemolytic and Ames (TA98 and TA100 strains) assays. It was observed that the RY-160A dye solution was toxic before treatment, and toxicity was reduced significantly after treatment. Results indicated that UV/H2O2/TiO2 is more efficient at degrading RY-160A versus other AOPs, which have potential application for the remediation of dyes in textile effluents.
This study was on the optoelectronic properties of multilayered two-dimensional MoS2 and WS2 materials on a silicon substrate using sputtering physical vapor deposition (PVD) and chemical vapor deposition (CVD) techniques. For the first time, we report ultraviolet (UV) photoresponses under air, CO2, and O2 environments at different flow rates. The electrical Hall effect measurement showed the existence of MoS2 (n-type)/Si (p-type) and WS2 (P-type)/Si (p-type) heterojunctions with a higher sheet carrier concentration of 5.50 × 105 cm−2 for WS2 thin film. The IV electrical results revealed that WS2 is more reactive than MoS2 film under different gas stimuli. WS2 film showed high stability under different bias voltages, even at zero bias voltage, due to the noticeably good carrier mobility of 29.8 × 102 cm2/V. WS2 film indicated a fast rise/decay time of 0.23/0.21 s under air while a faster response of 0.190/0.10 s under a CO2 environment was observed. Additionally, the external quantum efficiency of WS2 revealed a remarkable enhancement in the CO2 environment of 1.62 × 108 compared to MoS2 film with 6.74 × 106. According to our findings, the presence of CO2 on the surface of WS2 improves such optoelectronic properties as photocurrent gain, photoresponsivity, external quantum efficiency, and detectivity. These results indicate potential applications of WS2 as a photodetector under gas stimuli for future optoelectronic applications.