Ion-beam figuring (IBF) is a precise surface finishing technique used for the production of ultra-precision optical surfaces. In this study, we propose an effective one-dimensional IBF (1D-IBF) method approaching sub-nanometer root mean square (RMS) convergence for flat and spherical mirrors. Our process contains three key aspects. First, to minimize the misalignment of the coordinate systems between the metrology and the IBF hardware, a mirror holder is used to integrate both the sample mirror and the beam removal function (BRF) mirror. In this way, the coordinate relationship can be calculated using the measured BRF center. Second, we propose a novel constrained linear least-squares (CLLS) dwell time calculation algorithm combined with a coarse-to-fine scheme to ensure that the resultant nonnegative dwell time closely and smoothly duplicates the required removal amount. Third, considering the possible errors induced by the translation stage, we propose a dwell time slicing strategy to divide the dwell time into smaller time slices. Experiments using our approaches are performed on flat and spherical mirrors as demonstrations. Measurement results from the nano-accuracy surface profiler (NSP) show that the residual profile errors are reduced to sub-nanometer RMS for both types of mirrors while the surface roughness is not affected by the figuring process, demonstrating the effectiveness of the proposed 1D-IBF method for 1D high-precision optics fabrication.

Computer-Controlled Optical Surfacing (CCOS) has been greatly developed and widely used for precision optical fabrication in the past three decades. It relies on robust dwell time solutions to determine how long the polishing tools must dwell at certain points over the surfaces to achieve the expected forms. However, as dwell time calculations are modeled as ill-posed deconvolution, it is always non-trivial to reach a reliable solution that 1) is non-negative, since CCOS systems are not capable of adding materials, 2) minimizes the residual in the clear aperture 3) minimizes the total dwell time to guarantee the stability and efficiency of CCOS processes, 4) can be flexibly adapted to different tool paths, 5) the parameter tuning of the algorithm is simple, and 6) the computational cost is reasonable. In this study, we propose a novel Universal Dwell time Optimization (UDO) model that universally satisfies these criteria. First, the matrix-based discretization of the convolutional polishing model is employed so that dwell time can be flexibly calculated for arbitrary dwell points. Second, UDO simplifies the inverse deconvolution as a forward scalar optimization for the first time, which drastically increases the solution stability and the computational efficiency. Finally, the dwell time solution is improved by a robust iterative refinement and a total dwell time reduction scheme. The superiority and general applicability of the proposed algorithm are verified on the simulations of different CCOS processes. A real application of UDO in improving a synchrotron X-ray mirror using Ion Beam Figuring (IBF) is then demonstrated. The simulation indicates that the estimated residual in the 92.3 mm × 15.7 mm CA can be reduced from 6.32 nm Root Mean Square (RMS) to 0.20 nm RMS in 3.37 min. After one IBF process, the measured residual in the CA converges to 0.19 nm RMS, which coincides with the simulation.

With the rapid evolution of synchrotron X-ray sources, the demand for high-precision X-ray mirrors has greatly increased. Single nanometer profile error is required to keep imaging capability at the diffraction limit. Ion Beam Figuring (IBF), as a highly deterministic surfacing technique, has been used for ultra-precision finishing of mirrors. One crucial step that guides the IBF process is dwell time calculation. A valid dwell time solution should be non-negative and duplicate the shape of the desired removal map. Another important aspect is to minimize the total dwell time. In this study, we propose a Robust Iterative Fourier Transform-based dwell time Algorithm (RIFTA) that automatically fulfills these requirements. First, the thresholded inverse filtering in Fourier transform-based deconvolution is stabilized and automated by optimizing the threshold value using the Nelder-Mead simplex algorithm. Second, a novel two-level iterative scheme is proposed to guarantee the minimized total dwell time with its non-negativity at each dwell point. Third, a bicubic resampling is employed to flexibly adapt the calculated dwell time map to any IBF process intervals. The performance of RIFTA is first studied with simulation, followed by a comparison with the other state-of-the-art dwell time algorithms. We then demonstrate with an experiment that, using the dwell time calculated by the RIFTA, the total dwell time is shortened by a factor of two and the RMS in a 5 × 50 mm clear aperture was reduced from 3.4 nm to 1.1 nm after one IBF run, which proves the effectiveness and the efficiency of the proposed algorithm.

Precision optics have been widely required in many advanced technological applications. X-ray mirrors, as an example, serve as the key optical components at synchrotron radiation and free electron laser facilities. They are rectangular silicon or glass substrates where a rectangular Clear Aperture (CA) needs to be polished to sub-nanometer Root Mean Squared (RMS) to keep the imaging capability of the incoming X-ray wavefront at the diffraction limit. The convolutional polishing model requires a CA to be extended with extra data, from which the dwell time is calculated via deconvolution. However, since deconvolution is very sensitive to boundary errors and noise, the existing surface extension methods can hardly fulfill the sub-nanometer requirement. On one hand, the figure errors in a CA were improperly modeled during the extension, leading to continuity issues along the boundary. On the other hand, uncorrectable high-frequency errors and noise were also extended. In this study, we propose a novel Robust Iterative Surface Extension (RISE) method that resolves these problems with a data fitting strategy. RISE models the figure errors in a CA with orthogonal polynomials and ensures that only correctable errors are fit and extended. Combined with boundary conditions, an iterative refinement of dwell time is then proposed to compensate the errors brought by the extension and deconvolution, which drastically reduces the estimated figure error residuals in a CA while the increase of total dwell time is negligible. To our best knowledge, RISE is the first data fitting-based surface extension method and is the first to optimize dwell time based on iterative extension. An experimental verification of RISE is given by fabricating two elliptic cylinders (10 mm × 80 mm CAs) starting from a sphere with a radius of curvature around 173 m using ion beam figuring. The figure errors in the two CAs greatly improved from 204.96 nm RMS and 190.28 nm RMS to 0.62 nm RMS and 0.71 nm RMS, respectively, which proves that RISE is an effective method for sub-nanometer level X-ray mirror fabrication.

Optics with high-precision height and slope are increasingly desired in numerous industrial fields. For instance, Kirkpatrick–Baez (KB) mirrors play an important role in synchrotron X-ray applications. A KB system is composed of two aspherical, grazing-incidence mirrors used to focus an X-ray beam. The fabrication of KB mirrors is challenging due to the aspherical departure of the mirror surfaces from base geometries and the high-quality requirements for slope and height residuals. In this paper, we present the process of manufacturing an elliptical cylinder KB mirror using our in-house-developed ion beam figuring (IBF) and metrology technologies. First, the key aspects of figuring and finishing processes with IBF are illustrated in detail. The effect of positioning error on the convergence of the residual slope error is highlighted and compensated. Finally, inspection and cross-validation using different metrology instruments are performed and used as the final validation of the mirror. Results confirm that relative to the requested off-axis ellipse, the mirror has achieved 0.15-µrad root mean square (RMS) and 0.36-nm RMS residual slope and height errors, respectively, while maintaining the initial 0.3-nm RMS microroughness.