Shih-Hung  Lin

Prof. Shih-Hung Lin


Research Focus & Metrics

Academic Career Length

11Years (2016-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

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1 June 2021 in Ceramics International
Verified
Journal Article
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SLShih-Hung Lin
Shih-Hung Lin
ZLZi-Qi Lin
Zi-Qi Lin
CCChi-Wei Chen
Chi-Wei Chen

15 March 2021 in Polymers
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Journal Article
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ZTZong-Liang Tseng
Zong-Liang Tseng
SLShih-Hung Lin
Shih-Hung Lin
JTJian-Fu Tang
Jian-Fu Tang
Yu-Ching HuangYu-Ching Huang
Yu-Ching Huang
HCHsiang-Chih Cheng
Hsiang-Chih Cheng
Lung-Chien ChenLung-Chien Chen
Lung-Chien Chen
In this study, the performances of red CsPbI3-based all-inorganic perovskite quantum-dot light-emitting diodes (IPQLEDs) employing polymeric crystalline Poly(3-hexylthiophene-2,5-diyl) (P3HT), poly(9-vinycarbazole) (PVK), Poly(N,N′-bis-4-butylphenyl-N,N′-bisphenyl)benzidine (Poly-TPD) and 9,9-Bis[4-[(4-ethenylphenyl)methoxy]phenyl]-N2,N7-di-1-naphthalenyl-N2,N7-diphenyl-9H-fluorene-2,7-diamine (VB-FNPD) as the hole transporting layers (HTLs) have been demonstrated. The purpose of this work is an attempt to promote the development of device structures and hole transporting materials for the CsPbI3-based IPQLEDs via a comparative study of different HTLs. A full-coverage quantum dot (QD) film without the aggregation can be obtained by coating it with VB-FNPD, and thus, the best external quantum efficiency (EQE) of 7.28% was achieved in the VB-FNPD device. We also reported a standing method to further improve the degree of VB-FNPD polymerization, resulting in the improved device performance, with the EQE of 8.64%.

20 October 2021 in Coatings
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WLWen-Jen Liu
Wen-Jen Liu
YCYung-Huang Chang
Yung-Huang Chang
CFChi-Lon Fern
Chi-Lon Fern
Yuan-Tsung ChenYuan-Tsung Chen
Yuan-Tsung Chen
TJTian-Yi Jhou
Tian-Yi Jhou
TWTe-Ho Wu
Te-Ho Wu
This study investigated Co40Fe40W20 single-layer thin films according to their corresponding structure, grain size, contact angle, and surface energy characteristics. Co40Fe40W20 alloy thin films of different thicknesses, ranging from 10 to 50 nm, were sputtered on Si(100) substrates by DC magnetron sputtering. The thin films were annealed under three conditions: as-deposited, 250 °C, and 350 °C temperatures, respectively. The Scherrer equation was applied to calculate the grain size of Co40Fe40W20 thin films. The results show that the grain size of CoFe(110) increased simultaneously with the increase of post-annealing temperature, suggesting that the crystallinity of Co40Fe40W20 thin films increased with the post-annealing temperature. Moreover, the contact angles of all Co40Fe40W20 thin films were all less than 90°, suggesting that Co40Fe40W20 thin films show changes in the direction of higher hydrophilicity. However, we found that their contact angles decreased as the grain size of CoFe increased. Finally, the Young equation was applied to calculate the surface energy of Co40Fe40W20 thin films. After post-annealing, the surface energy of Co40Fe40W20 thin films increased with the rising post-annealing temperature. This is the highest value of surface energy observed for 350 °C. In addition, the surface energy increased as the contact angle of Co40Fe40W20 thin films decreased. The high surface energy means stronger adhesion, allowing the formation of multilayer thin films with magnetic tunneling junctions (MTJs). The sheet resistance of the as-deposited and thinner CoFeW films is larger than annealed and thicker CoFeW films. When the thickness is from 10 nm to 50 nm, the hardness and Young’s modulus of the CoFeW film also show a saturation trend.

1 March 2022 in Materials Science in Semiconductor Processing
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Journal Article
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SLShih-Hung Lin
Shih-Hung Lin
RYRong-Hwei Yeh
Rong-Hwei Yeh
CCChen Chu
Chen Chu
RYRuei-Sung Yu
Ruei-Sung Yu

31 October 2023 in Materials
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CFChi-Lon Fern
Chi-Lon Fern
WLWen-Jen Liu
Wen-Jen Liu
YCYung-Huang Chang
Yung-Huang Chang
CCChia-Chin Chiang
Chia-Chin Chiang
Yuan-Tsung ChenYuan-Tsung Chen
Yuan-Tsung Chen
KLKo-Wei Lin
Ko-Wei Lin
Co60Fe20Sm20 thin films were deposited onto glass substrates in a high vacuum setting. The films varied in thickness from 10 to 50 nm and underwent annealing processes at different temperatures: room temperature (RT), 100, 200, and 300 °C. Our analysis encompassed structural, magnetic, electrical, nanomechanical, adhesive, and optical properties in relation to film thickness and annealing temperature. X-ray diffraction (XRD) analysis did not reveal characteristic peaks in Co60Fe20Sm20 thin films due to insufficient growth-driving forces. Electrical measurements indicated reduced resistivity and sheet resistance with increasing film thickness and higher annealing temperatures, owing to hindered current-carrier transport resulting from the amorphous structure. Atomic force microscope (AFM) analysis showed a decrease in surface roughness with increased thickness and annealing temperature. The low-frequency alternating current magnetic susceptibility (χac) values increased with film thickness and annealing temperature. Nanoindentation analysis demonstrated reduced film hardness and Young’s modulus with thicker films. Contact angle measurements suggested a hydrophilic film. Surface energy increased with greater film thickness, particularly in annealed films, indicating a decrease in contact angle contributing to this increase. Transmittance measurements have revealed intensified absorption and reduced transmittance with thicker films. In summary, the surface roughness of CoFeSm films at different annealing temperatures significantly influenced their magnetic, electrical, adhesive, and optical properties. A smoother surface reduced the pinning effect on the domain walls, enhancing the χac value. Additionally, diminished surface roughness led to a lower contact angle and higher surface energy. Additionally, smoother surfaces exhibited higher carrier conductivity, resulting in reduced electrical resistance. The optical transparency decreased due to the smoother surface of Co60Fe20Sm20 films.

31 August 2023 in Materials
Verified
Journal Article
Open access
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WLWen-Jen Liu
Wen-Jen Liu
YCYung-Huang Chang
Yung-Huang Chang
CCChia-Chin Chiang
Chia-Chin Chiang
Yuan-Tsung ChenYuan-Tsung Chen
Yuan-Tsung Chen
YWYu-Zhi Wang
Yu-Zhi Wang
SOSin-Liang Ou
Sin-Liang Ou
In this study, Co40Fe40B10Dy10 thin films were deposited using a direct current (DC) magnetron sputtering technique. The films were deposited on glass substrates with thicknesses of 10, 20, 30, 40, and 50 nm, and heat-treated in a vacuum annealing furnace at 100, 200, and 300 °C. Various instruments were used to examine and analyze the effects of roughness on the magnetic, adhesive, and mechanical properties. From the low frequency alternating current magnetic susceptibility (χac) results, the optimum resonance frequency is 50 Hz, and the maximum χac value tends to increase with the increase in the thicknesses and annealing temperatures. The maximum χac value is 0.18 at a film thickness of 50 nm and an annealing temperature of 300 °C. From the four-point probe, it is found that the resistivity and sheet resistance values decrease with the increase in film deposition thicknesses and higher annealing temperatures. From the magnetic force microscopy (MFM), the stripe-like magnetic domain distribution is more obvious with the increase in annealing temperature. According to the contact angle data, at the same annealing temperature, the contact angle decreases as the thickness increases due to changes in surface morphology. The maximal surface energy value at 300 °C is 34.71 mJ/mm2. The transmittance decreases with increasing film thickness, while the absorption intensity is inversely proportional to the transmittance, implying that the thickness effect suppresses the photon signal. Smoother roughness has less domain pinning, more carrier conductivity, and less light scattering, resulting in superior magnetic, electrical, adhesive, and optical performance.