Min-Cheng Chen

Dr. Min-Cheng Chen


Research Focus & Metrics

Academic Career Length

16Years (2011-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

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26 March 2012 in Sensors
Verified
Journal Article
Open access
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MCMin-Cheng Chen
Min-Cheng Chen
HCHao-Yu Chen
Hao-Yu Chen
CLChia-Yi Lin
Chia-Yi Lin
CCChao-Hsin Chien
Chao-Hsin Chien
THTsung-Fan Hsieh
Tsung-Fan Hsieh
FYFu-Liang Yang
Fu-Liang Yang
This paper reports a versatile nano-sensor technology using “top-down” poly-silicon nanowire field-effect transistors (FETs) in the conventional Complementary Metal-Oxide Semiconductor (CMOS)-compatible semiconductor process. The nanowire manufacturing technique reduced nanowire width scaling to 50 nm without use of extra lithography equipment, and exhibited superior device uniformity. These n type polysilicon nanowire FETs have positive pH sensitivity (100 mV/pH) and sensitive deoxyribonucleic acid (DNA) detection ability (100 pM) at normal system operation voltages. Specially designed oxide-nitride-oxide buried oxide nanowire realizes an electrically Vth-adjustable sensor to compensate device variation. These nanowire FETs also enable non-volatile memory application for a large and steady Vth adjustment window (>2 V Programming/Erasing window). The CMOS-compatible manufacturing technique of polysilicon nanowire FETs offers a possible solution for commercial System-on-Chip biosensor application, which enables portable physiology monitoring and in situ recording.

1 April 2011 in Japanese Journal of Applied Physics
Verified
Journal Article
Closed access
HCHou-Yu Chen
Hou-Yu Chen
CLChia-Yi Lin
Chia-Yi Lin
MCMin-Cheng Chen
Min-Cheng Chen
CHChien-Chao Huang
Chien-Chao Huang
CCChao-Hsin Chien
Chao-Hsin Chien

10 February 2012 in IEEE Electron Device Letters
Verified
Journal Article
Closed access
MCMin-Cheng Chen
Min-Cheng Chen
CLChia-Yi Lin
Chia-Yi Lin
BCBo-Yuan Chen
Bo-Yuan Chen
CLChang-Hsien Lin
Chang-Hsien Lin
GHGuo-Wei Huang
Guo-Wei Huang
FYFu-Liang Yang
Fu-Liang Yang
The behavior of random telegraph noise was affected by nickel silicide barrier height engineering in advanced nano-CMOS technologies. Contact resistance fluctuations with magnitude of up to 40% were observed when a Schottky barrier was reduced to 0.2 eV. The large contact resistance instability is attributed to the barrier modification by positive charge trapping and detrapping in a Schottky contact. The prevalence and magnitude of the noise are dependent on the contact area, trap density, trap energy, and the silicide Schottky barrier height. In this letter, we propose a fast method to extract the density of responsible contact traps.

14 February 2014 in IEEE Transactions on Electron Devices
Verified
Journal Article
Closed access
MCMin-Cheng Chen
Min-Cheng Chen
CLChang-Hsien Lin
Chang-Hsien Lin
CLChia-Yi Lin
Chia-Yi Lin
HCHsiao-Chain Chen
Hsiao-Chain Chen
TLTa-Hsien Lee
Ta-Hsien Lee
FYFu-Liang Yang
Fu-Liang Yang
Using a self-aligned sidewall microcrystalline-silicon (μc-Si) dual channel, comprising a sub-50-nm channel width, a novel 3-D stackable maskless embedded metal-gate thin-film-transistor nanowire device was fabricated on top metal using a tungsten gate-stack and trilayered oxide/nitride/oxide gate dielectric. The results of using a charge-transferring mechanism based on the solution-phased pH of a phosphate buffer solution and vascular endothelial growth factor showed that μc-Si surfaces exhibit high potential for use in bioelectronics. The device exhibits long-term reliability regarding bioelectronic probing and is as reliable as the commercially available enzyme-linked immunosorbent assay when conducting a targeted, 100-day therapy for ovarian cancer. Thus, the proposed device exhibits potential for use in label-free, economical, and highly reliable lab-on-chip 3-D applications.