We use subwavelength gratings (SWGs) to engineer the refractive index in microphotonic waveguides, including practical components such as input couplers and multiplexer circuits. This technique allows for direct control of the mode confinement by changing the refractive index of a waveguide core over a range as broad as 1.6–3.5 by lithographic patterning. We demonstrate two experimental examples of refractive index engineering, namely, a microphotonic fiber-chip coupler with a coupling loss as small as $-0.9\mathrm{dB}$ and minimal wavelength dependence and a planar waveguide multiplexer with SWG nanostructure, which acts as a slab waveguide for light diffracted by the grating, while at the same time acting as a lateral cladding for the strip waveguide. This yields an operation bandwidth of $170\mathrm{nm}$ for a device size of only ~$160\mathrm{\mu m}\times 100\mathrm{\mu m}$.

Coupling of light to and from integrated optical circuits has been recognized as a major practical challenge since the early years of photonics. The coupling is particularly difficult for high index contrast waveguides such as silicon-on-insulator, since the cross-sectional area of silicon wire waveguides is more than two orders of magnitude smaller than that of a standard single-mode fiber. Here, we experimentally demonstrate unprecedented control over the light coupling between the optical fiber and silicon chip by constructing the nanophotonic coupler with ultra-high coupling efficiency simultaneously for both transverse electric and transverse magnetic polarizations. We specifically demonstrate a subwavelength refractive index engineered nanostructure to mitigate loss and wavelength resonances by suppressing diffraction effects, enabling a coupling efficiency over 92% (0.32 dB) and polarization independent operation for a broad spectral range exceeding 100 nm.

We propose a silicon waveguide-fiber grating coupler that uses a subwavelength microstructure to achieve a continuously variable grating strength yet can be fabricated using only a single etch step. By adjusting the subwavelength microstructure at every point along the grating, the grating coupler can be optimized to give high field overlap with the optical fiber mode and also minimize backreflections along the incident waveguide path. Our design example is optimized for quasi-TM mode in a silicon photonic-wire waveguide, as required for waveguide evanescent-field-sensing applications. A field overlap of up to 94% with a standard single-mode optical fiber (SMF-28) is achieved by coupler apodization. Backreflection from the grating is reduced to $\sim 0.1\%$, and the total predicted photonic wire to fiber coupling efficiency is 50%.

We report a stationary Fourier-transform spectrometer chip implemented in silicon microphotonic waveguides. The device comprises an array of 32 Mach–Zehnder interferometers (MZIs) with linearly increasing optical path delays between the MZI arms across the array. The optical delays are achieved by using Si-wire waveguides arranged in tightly coiled spirals with a compact device footprint of $12{\mathrm{mm}}^2$. Spectral retrieval is demonstrated in a single measurement of the stationary spatial interferogram formed at the output waveguides of the array, with a wavelength resolution of 40 pm within a free spectral range of 0.75 nm. The phase and amplitude errors arising from fabrication imperfections are compensated using a transformation matrix spectral retrieval algorithm.

Fiber-chip edge couplers are extensively used in integrated optics for coupling of light between planar waveguide circuits and optical fibers. In this work, we report on a new fiber-chip edge coupler concept with large mode size for silicon photonic wire waveguides. The coupler allows direct coupling with conventional cleaved optical fibers with large mode size while circumventing the need for lensed fibers. The coupler is designed for 220 nm silicon-on-insulator (SOI) platform. It exhibits an overall coupling efficiency exceeding 90%, as independently confirmed by 3D Finite-Difference Time-Domain (FDTD) and fully vectorial 3D Eigenmode Expansion (EME) calculations. We present two specific coupler designs, namely for a high numerical aperture single mode optical fiber with 6 µm mode field diameter (MFD) and a standard SMF-28 fiber with 10.4 µm MFD. An important advantage of our coupler concept is the ability to expand the mode at the chip edge without leading to high substrate leakage losses through buried oxide (BOX), which in our design is set to 3 µm. This remarkable feature is achieved by implementing in the SiO₂ upper cladding thin high-index Si₃N₄ layers. The Si₃N₄ layers increase the effective refractive index of the upper cladding near the facet. The index is controlled along the taper by subwavelength refractive index engineering to facilitate adiabatic mode transformation to the silicon wire waveguide while the Si-wire waveguide is inversely tapered along the coupler. The mode overlap optimization at the chip facet is carried out with a full vectorial mode solver. The mode transformation along the coupler is studied using 3D-FDTD simulations and with fully-vectorial 3D-EME calculations. The couplers are optimized for operating with transverse electric (TE) polarization and the operating wavelength is centered at 1.55 µm.