Three-dimensional (3D) nanostructures have attracted widespread attention in physics, chemistry, engineering sciences, and biology devices due to excellent functionalities which planar nanostructures cannot achieve. However, the fabrication of 3D nanostructures is still challenging at present. Reliable fabrication, improved controllability, and multifunction integration are desired for further applications in commercial devices. In this review, a powerful fabrication method to realize 3D nanostructures is introduced and reviewed thoroughly, which is based on atomic layer deposition assisted 3D assembly through various sacrificial templates. The aim of this review is to provide a comprehensive overview of 3D nanofabrication based on atomic layer assembly (ALA) in multifarious sacrificial templates for 3D nanostructures and to present recent advancements, with the ultimate aim to further unlock more potential of this method for nanodevice applications.

Besides the intensity and wavelength, the ability to analyze the optical polarization of detected light can provide a new degree of freedom for numerous applications, such as object recognition, biomedical applications, environmental monitoring, and remote sensing imaging. However, conventional filter-integrated polarimetric sensing systems require complex optical components and a complicated fabrication process, severely limiting their on-chip miniaturization and functionalities. Herein, the reconfigurable polarimetric photodetection with photovoltaic mode is developed based on a few-layer MoS₂/PdSe₂ heterostructure channel and a charge-trap structure composed of Al₂O₃/HfO₂/Al₂O₃ (AHA)-stacked dielectrics. Because of the remarkable charge-trapping ability of carriers in the AHA stack, the MoS₂/PdSe₂ channel exhibits a high program/erase current ratio of 10⁵ and a memory window exceeding 20 V. Moreover, the photovoltaic mode of the MoS₂/PdSe₂ Schottky diode can be operated and manipulable, resulting in high and distinct responsivities in the visible broadband. Interestingly, the linear polarization of the device can be modulated under program/erase states, enabling the reconfigurable capability of linearly polarized photodetection. This study demonstrates a new prototype heterostructure-based photodetector with the capability of both tunable responsivity and linear polarization, demonstrating great potential application toward reconfigurable photosensing and polarization-resolved imaging applications.

Two-hierarchical nanostructures, characterized by two distinct configurations along the height direction, exhibit immense potential for applications in various fields due to their significantly enhanced controllable degree compared to single-order structures. However, due to the limitations imposed by planar technology, the realization of two-hierarchical nanostructures encounters huge challenges. In this work, we developed a one-step etching method based on inductively coupled plasma reactive ion etching for two-hierarchical nanostructures. Thanks to the shrinking effect of the Cr mask and the generation of a passivation layer during etching, the target materials experienced two different states from vertical etching to shrink etching. Consequently, the achieved two-hierarchical nanostructure configuration features a cross-section of an upper triangle and a lower rectangle, showing higher controllable degrees compared to the one-order ones. Both the mask pattern and etching parameters play crucial roles, by which two-hierarchical structures with diversiform shapes can be constructed controllably. This method for two-hierarchical nanostructures offers advantages including excellent control over structural properties, high processing efficiency, uniformity across large areas, and universality in materials. This developed strategy not only presents a simple and rapid nanofabrication platform for realizing optoelectronic devices, but also provides innovative ideas for designing the next generation of high-performance devices.

Graphene has potential applications in future microelectronics due to its novel electronic and mechanical properties. However, the lack of the bandgap in graphene poses a challenge and hinders its applications. In order to be able to work in ambient condition, gap engineering of graphene with nanostructure needs about sub-10 nm characteristic size, which increases the difficulty of fabrication and leads to less driving current that can be borne. In this paper, a new method to fabricate sub-10 nm graphene nanostructures is developed. With PMMA/Cr bilayer structure, sub-10 nm graphene nanostructures can be obtained precisely and repeatedly through controlling the etching time. Meanwhile, a new device based on graphene nanoconstrictions connected in parallel is designed and fabricated, whose band gap is bigger than that of graphene nanoribbon and whose characteristic width is the same as that of graphene nanoribbon. With the graphene nanoconstrictions connected in parallel, the band gap of the graphene can be adjusted effectively and the driving current can be significantly increased, which is very important for future practical applications of graphene.