The global shortage of clean water is a major problem, even in water-rich regions. To solve this problem, low-cost and energy-efficient water treatment methods are needed. Membrane separation technology (MST), as a separation method with low energy consumption, low cost, and good separation effect, has been widely used to deal with seawater desalination, resource recovery, industrial wastewater treatment, and other fields. With the continuous progress of scientific and technological innovation and the increasing demand for use, NF/RO membranes based on the TFC structure are constantly being upgraded. This paper presents the recent research progress of NF and RO membranes based on TFC structures and their applications in different fields, especially the formation mechanism and regulation of selective layer structures and the modification methods of selective layers. Our summary provides fundamental insights into the understanding of NF and RO membrane processes and hopefully triggers further thinking on the development of membrane filtration process optimization.
A novel imprinted ZnO/magnetic fly-ash photocatalyst (imprinted ZnO/MFA) was synthesized by the imprinting technique based on danofloxacin mesylate (DM) as the template molecule, zinc acetate as the reactive precursor, magnetic fly-ash (MFA) as the matrix material. The as-prepared imprinted ZnO/MFA was extensively characterized by X-ray diffraction (XRD), scanning electron microscope (SEM), elemental analysis, UV-vis diffused reflectance spectra (UV-vis) and vibrating sample magnetometer (VSM). The results indicated that imprinted ZnO/MFA possessed like-spherical structure, superior magnetic property (Ms = 30.31 emu/g), the average diameter of imprinted ZnO/MFA was approximately 80 μm. Moreover, imprinted ZnO/MFA was proved to exhibit higher photocatalytic efficiency than other photocatalysts and the degradation rate of degradation of DM in 120 min under the ultraviolet light irradiation was 89.64%. In addition, compared with ZnO/magnetic fly-ash photocatalyst (ZnO/MFA), imprinted ZnO/MFA showed good selectivity for photodegradation of DM.