Frédéric Fossard

Dr. Frédéric Fossard

orcid

Research Focus & Metrics

Academic Career Length

26Years (2001-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

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25 May 2015 in Nature Materials
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AFAlexandre Favron
Alexandre Favron
EGEtienne Gaufrès
Etienne Gaufrès
FFFrédéric Fossard
Frédéric Fossard
APAnne-Laurence Phaneuf-L’heureux
Anne-Laurence Phaneuf-L’heureux
NTNathalie Y-W. Tang
Nathalie Y-W. Tang
RMRichard Martel
Richard Martel

1 March 2017 in Carbon
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Journal Article
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MHMaoshuai He
Maoshuai He
YMYann Magnin
Yann Magnin
HAHakim Amara
Hakim Amara
HJHua Jiang
Hua Jiang
HCHongzhi Cui
Hongzhi Cui
CBChristophe Bichara
Christophe Bichara

30 November 2016 in 2D Materials
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LSLéonard Schué
Léonard Schué
ISIngrid Stenger
Ingrid Stenger
FFFrédéric Fossard
Frédéric Fossard
ALAnnick Loiseau
Annick Loiseau
JBJulien Barjon
Julien Barjon
Hexagonal boron nitride (hBN) has regained interest as a strategic component in graphene engineering and in van der Waals heterostructures built with two dimensional materials. It is crucial then, to handle reliable characterization techniques capable to assess the quality of structural and electronic properties of the hBN material used. We present here characterization procedures based on optical spectroscopies, namely cathodoluminescence and Raman, with the additional support of structural analysis conducted by transmission electron microscopy. We show the capability of optical spectroscopies to investigate and benchmark the optical and structural properties of various hBN thin layers sources.

3 May 2004 in Applied Physics Letters
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EMEva Monroy
Eva Monroy
ESEirini Sarigiannidou
Eirini Sarigiannidou
FFFrédéric Fossard
Frédéric Fossard
Noelle GogneauNoelle Gogneau
Noelle Gogneau
EBE. Bellet-Amalric
E. Bellet-Amalric
BDB. Daudin
B. Daudin
We have studied the surface kinetics of N-face GaN during molecular-beam epitaxial growth by investigating the Ga wetting and the surface morphology. In the case of N-face GaN, it is not possible to establish the self-regulated Ga bilayer that is used as a surfactant for molecular-beam-epitaxy growth of Ga-face GaN. Indeed, to prevent the accumulation of Ga droplets, growth of the N-face GaN must be performed with less than one monolayer of excess Ga on the growing surface. Optimum surface morphology is achieved when growth is performed at the Ga accumulation limit.

22 July 2024 in Chemical Society Reviews
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CACharlotte Allard
Charlotte Allard
LALaurent Alvarez
Laurent Alvarez
JBJean-Louis Bantignies
Jean-Louis Bantignies
NBNedjma Bendiab
Nedjma Bendiab
SCSofie Cambré
Sofie Cambré
WWWim Wenseleers
Wim Wenseleers
Nanotubes as a versatile platform for molecular organization in 1D.

1 September 2003 in Journal of Applied Physics
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EMEva Monroy
Eva Monroy
Noelle GogneauNoelle Gogneau
Noelle Gogneau
FEF. Enjalbert
F. Enjalbert
FFFrédéric Fossard
Frédéric Fossard
DJD. Jalabert
D. Jalabert
BDB. Daudin
B. Daudin
We report on the controlled growth and characterization of quaternary AlGaInN compounds by plasma-assisted molecular beam epitaxy. Two-dimensional growth is achieved with a monolayer of In segregating at the growth front. In incorporation is hindered by increasing growth temperature and Al mole fraction, which is explained by the lower binding energy of InN compared to GaN and AlN. The mosaicity of the layers is determined by the substrate quality, whereas the alloy disorder increases with the Al content, independent of the In mole fraction. Room temperature photoluminescence is dominated by a narrow band-edge emission, whose Stokes shift and activation energy increase with the In content. This behavior is interpreted in terms of carrier localization in self-formed alloy inhomogeneities. An In-related band bowing parameter of 2.5 eV has been estimated.