Ammonia as a non-carbon fuel is expected to play an important role in the future, but it is difficult to be effectively utilized at this stage due to its flame retardancy and other characteristics. Therefore, we propose to use gliding arc plasma combined with a swirl burner to enhance the combustion performance of ammonia. The electrical characteristics, electron density, gas rotational temperature and the distribution of key active species in the burner were studied via optical emission spectroscopy (OES). With the increase of equivalence ratio (EQR), the width of the H_α line decreases significantly, indicating that the electron density shows a downward trend, even as the gas rotational temperature shows an upward trend. When the equivalence ratio was 0.5, the gas rotational temperature increases by about 320 K compared with the pure air condition. During pure air discharge, there will still be obvious NO emission due to the plasma reaction, but with the addition of NH₃, the NO content in the emission is significantly reduced. The light intensity of O atoms in the burner gradually decreases with the increase of the equivalence ratio, the light intensity of H atoms increases first and then decreases, and the light intensity of NH shows an upward trend. The reason may be that the plasma discharge effectively strengthens NH₃(E)->NH₂+H, NH₂+H->NH+H₂ and other reactions promote the initial reaction step of NH₃ which thus effectively strengthens the NH₃ combustion.

To better understand how positive bias and deposition pressure affect the plasma flow properties in the deposition chamber during the bias-enhanced MPCVD process, a two-dimensional axisymmetric model based on the discharge mechanism of pure H₂ was constructed. The coupling process between different physical field models of the electromagnetic field, plasma, and temperature field in the MPCVD reactor is realized. We studied the influence of positive bias voltage and deposition pressure variation on microwave plasma flow characteristics in the deposition chamber. There was a bias voltage threshold phenomenon in the case of positive bias, and the suitable value range was narrow. Additionally, with the increase in the deposition pressure, the electron temperature in the deposition chamber tends to increase locally and reaches its maximum value when the pressure is approximately 30 torr. It provides new ideas and guidance for optimizing the process parameter setting of the bias-enhanced MPCVD process.