Ga₂O₃-based solar blind avalanche photodetectors exhibit low voltage operation, optical filter-free and monolithic integration of photodetector arrays, and therefore they are promising to be an alternative to the bulky and fragile photomultiplier tubes for weak signal detection in deep-ultraviolet region. Here, by deliberate lattice and band engineering, we construct an n-Barrier-n unipolar barrier avalanche photodetector consisting of β-Ga₂O₃/MgO/Nb:SrTiO₃ heterostructure, in which the enlarged conduction band offsets fortify the reverse breakdown and suppress the dark current while the negligible valance band offsets faciliate minority carrier flow across the heterojunction. The developed devices exhibit record-high avalanche gain up to 5.9 × 10⁵ and detectivity of 2.33 × 10¹⁶ Jones among the reported wafer-scale grown Ga₂O₃-based photodetectors, which are even comparable to the commercial photomultiplier tubes. These findings provide insights into precise manipulation of band alignment in avalanche photodetectors, and also offer exciting opportunities for further developing high-performance Ga₂O₃-based electronics and optoelectronics.

Silicon, renowned for its applications in electronic circuits, also offers significant advantages in the realm of integrated optics. While silicon does have inherent limitations in fabricating active devices, these challenges can be overcome through heterogeneous integration with other materials. Ferroelectric materials like lithium niobate (LN) and barium titanate (BTO) exhibit exceptional electrical and nonlinear optical properties, making them ideal candidates for integrated silicon photonics. Over the past few decades, the LN platform has made substantial progress, surmounting obstacles such as manufacturing difficulties, high waveguide losses, and low modulation bandwidth caused by wide electrode spacing. Consequently, LN-based devices have found widespread application in various fields. With the advent of high-quality, large-size LN on insulator wafers, LN photonics has become a burgeoning research area. At the same time, the ferroelectric material BTO, with its tremendous electro-optic response, shows promise for the next generation of integrated photonics. Recent studies have highlighted the remarkable performance of BTO-based modulators, which offer smaller device sizes compared to LN by achieving lower half-wave voltages. This comprehensive review presents various fabrication methods for integrating LN and BTO thin films on silicon, focusing on recent advancements. We discuss their electro-optic responses and provide an overview of the diverse applications enabled by these platforms. Finally, we summarize the current state of integrated LN and BTO photonics research and offer insights into future directions.