Material removal in the cutting process is regarded as a friction system with multiple input and output variables. The complexity of the cutting friction system is caused by the extreme conditions existing on the tool–chip and tool–workpiece interfaces. The critical issue is significant to use knowledge of cutting friction behaviors to guide researchers and industrial manufacturing engineers in designing rational cutting processes to reduce tool wear and improve surface quality. This review focuses on the state of the art of research on friction behaviors in cutting procedures as well as future perspectives. First, the cutting friction phenomena under extreme conditions, such as high temperature, large strain/strain rates, sticking–sliding contact states, and diverse cutting conditions are analyzed. Second, the theoretical models of cutting friction behaviors and the application of simulation technology are discussed. Third, the factors that affect friction behaviors are analyzed, including material matching, cutting parameters, lubrication/cooling conditions, micro/nano surface textures, and tool coatings. Then, the consequences of the cutting friction phenomena, including tool wear patterns, tool life, chip formation, and the machined surface are analyzed. Finally, the research limitations and future work for cutting friction behaviors are discussed. This review contributes to the understanding of cutting friction behaviors and the development of high-quality cutting technology.

The calculation of the dwell time plays a crucial role in polishing precision large optics. Although some studies have taken place, it remains a challenge to develop a calculation algorithm which is absolutely stable, together with a high convergence ratio and fast solution speed even for extremely large mirrors. For this aim, we introduced a self-adaptive iterative algorithm to calculate the dwell time in this paper. Simulations were conducted in bonnet polishing (BP) to test the performance of this method on a real $430\mathrm{mm}\times 430\mathrm{mm}$ fused silica part with the initial surface error $\mathrm{PV}=1741.29\mathrm{nm}$, $\mathrm{RMS}=433.204\mathrm{nm}$. The final surface residual error in the clear aperture after two simulation steps turned out to be $\mathrm{PV}=11.7\mathrm{nm}$, $\mathrm{RMS}=0.5\mathrm{nm}$. The results confirm that this method is stable and has a high convergence ratio and fast solution speed even with an ordinary computer. It is notable that the solution time is usually just a few seconds even on a $1000\mathrm{mm}\times 1000\mathrm{mm}$ part. Hence, we believe that this method is perfectly suitable for polishing large optics. And not only can it be applied to BP, but it can also be applied to other subaperture deterministic polishing processes.