Veit Wagner

Prof. Veit Wagner


Research Focus & Metrics

Academic Career Length

33Years (1994-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

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9 July 2010 in Advanced Materials
Verified
Journal Article
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JRJonathan Rivnay
Jonathan Rivnay
MTMichael F. Toney
Michael F. Toney
YZYan Zheng
Yan Zheng
IKIsaac V. Kauvar
Isaac V. Kauvar
ZCZhihua Chen
Zhihua Chen
ASAlberto Salleo
Alberto Salleo

30 January 1995 in Physical Review Letters
Verified
Journal Article
Open access
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TDT. Dekorsy
T. Dekorsy
HAH. Auer
H. Auer
CWC. Waschke
C. Waschke
HBH. J. Bakker
H. J. Bakker
HRHartmut G. Roskos
Hartmut G. Roskos
PGP. Grosse
P. Grosse
We report on the first observation of the emission of electromagnetic radiation from coherent lattice vibrations in a semiconductor. Coherent optical phonons are excited by ultrashort laser pulses in single-crystal tellurium. THz frequency radiation emitted by the Dember-field-driven phonons is detected by time-resolved THz-emission spectroscopy. The measurements are complemented by optical pump-probe experiments with a polarization-sensitive detection scheme utilizing the symmetry of the Raman tensor.

13 April 2004 in Applied Physics Letters
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Journal Article
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Henrique Leonel GomesHenrique Leonel Gomes
Henrique Leonel Gomes
PSPeter Stallinga
Peter Stallinga
FDF. Dinelli
F. Dinelli
MMM. Murgia
M. Murgia
FBF. Biscarini
F. Biscarini
VWVeit Wagner
Veit Wagner
An investigation into the stability of metal-insulator-semiconductor (MIS) transistors based on α-sexithiophene is reported. In particular, the kinetics of the threshold voltage shift upon application of a gate bias has been determined. The kinetics follow stretched-hyperbola-type behavior, in agreement with the formalism developed to explain metastability in amorphous-silicon thin-film transistors. Using this model, quantification of device stability is possible. Temperature-dependent measurements show that there are two processes involved in the threshold voltage shift, one occurring at T≈220 K and the other at T≈300 K. The latter process is found to be sample dependent. This suggests a relation between device stability and processing parameters.

22 June 2012 in Advanced Materials
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Journal Article
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MMMarko Marinkovic
Marko Marinkovic
DBDagmawi Belaineh
Dagmawi Belaineh
VWVeit Wagner
Veit Wagner
DKDietmar Knipp
Dietmar Knipp


1 November 2004 in Synthetic Metals
Verified
Journal Article
Closed access
TMT. Muck
T. Muck
VWVeit Wagner
Veit Wagner
UBU. Bass
U. Bass
MLM. Leufgen
M. Leufgen
JGJ. Geurts
J. Geurts
LML.W. Molenkamp
L.W. Molenkamp