Ryuji Oshima is a senior scientist in the Global Zero Emission Research Center at National Institute of Advanced Industrial Science and Technology (AIST) in Japan, where he investigates high-efficiency, low-cost III-V multijunction devices. He has specialized in the epitaxy of semiconductor materials by a variety of growth methods including hydride vapor phase epitaxy, metal-organic vapor phase epitaxy, and molecular beam epitaxy. He earned a doctorate in engineering at the University of Tsukuba in Japan. He also participated in an AIST-National Renewable Energy Laboratory (NREL) research exchange in 2014-2015.
Ryuji Oshima is a senior scientist in the Global Zero Emission Research Center at National Institute of Advanced Industrial Science and Technology (AIST) in Japan, where he investigates high-efficiency, low-cost III-V multijunction devices. He has specialized in the epitaxy of semiconductor materials by a variety of growth methods including hydride vapor phase epitaxy, metal-organic vapor phase epitaxy, and molecular beam epitaxy. He earned a doctorate in engineering at the University of Tsukuba in Japan. He also participated in an AIST-National Renewable Energy Laboratory (NREL) research exchange in 2014-2015.