Meta-optics based on metasurfaces that interact strongly with light has been an active area of research in recent years. The development of meta-optics has always been driven by human’s pursuits of the ultimate miniaturization of optical elements, on-demand design and control of light beams, and processing hidden modalities of light. Underpinned by meta-optical physics, meta-optical devices have produced potentially disruptive applications in light manipulation and ultra-light optics. Among them, optical metalens are most fundamental and prominent meta-devices, owing to their powerful abilities in advanced imaging and image processing, and their novel functionalities in light manipulation. This review focuses on recent advances in the fundamentals and applications of the field defined by excavating new optical physics and breaking the limitations of light manipulation. In addition, we have deeply explored the metalenses and metalens-based devices with novel functionalities, and their applications in computational imaging and image processing. We also provide an outlook on this active field in the end.

Retroreflective gratings serve as fundamental optical elements in nanophotonics, with polarization-independent diffraction efficiency being one of the critical parameters for assessing their performance. In the far-infrared spectral range, traditional retroreflective gratings typically refer to metal echelette gratings, but their diffraction efficiency cannot approach 100% due to metal absorption. In the visible and near-infrared spectral ranges, metal echelette gratings have gradually been replaced by all-dielectric metasurfaces because dielectric materials exhibit negligible absorption at specific wavelengths. However, there is still a lack of relevant research in the far-infrared range, mainly due to the weak control capability of the existing devices over the polarization-independent phase. Here, we propose a kind of all-dielectric retroreflective metasurface composed of asymmetric pillars and freely tunable aperiodic multilayer films. The pillar structure can achieve polarization insensitivity, and the insufficient modulation capability of the dielectric materials can be compensated for by aperiodic Ge/ZnS films. The designed metasurface achieves the diffraction efficiency by RCWA, with the maximum larger than 99% and the overall reaching 95% (9.3–9.6 µm). We have provided detailed explanations of the design methodology and fabrication process. Our work lays the groundwork for further exploration and application of far-infrared lasers.

Polarization imaging has been proven as an important technique for obtaining multi-dimensional information in complex environments. As the prevalent polarizers, metal gratings are widely used especially for focal-plane detection due to their flexibility and easy integration. However, high-performance polarization gratings with high transmittance and large extinction ratios typically need a large aspect ratio in design, resulting in more difficulties in fabrication with limited practical performances. In this study, we designed and fabricated a high-performance polarizer using metallic–dielectric gratings (MDGs). Through a single CMOS-compatible procedure that included electron-beam lithography (EBL) and a collimated thermal evaporation deposition process, we achieved a high TM transmittance (~90%) and a high extinction ratio (~100:1) in the experiment. We believe that our work provides an effective approach to high-performance polarization gratings, which could contribute to the development of on-chip integrated polarization imaging.

On-chip multi-dimensional detection systems integrating pixelated polarization and spectral filter arrays are the latest trend in optical detection instruments, showing broad application potential for diagnostic medical imaging and remote sensing. However, thin-film or microstructure-based filter arrays typically have a trade-off between the detection dimension, optical efficiency, and spectral resolution. Here, we demonstrate novel on-chip integrated polarization spectral detection filter arrays consisting of metasurfaces and multilayer films. The metasurfaces with two nanopillars in one supercell are designed to modulate the Jones matrix for polarization selection. The angle of diffraction of the metasurfaces and the optical Fabry–Perot (FP) cavities determine the spectrum’s center wavelength. The polarization spectral filter arrays are placed on top of the CMOS sensor; each array corresponds to one pixel, resulting in high spectral resolution and optical efficiency in the selected polarization state. To verify the methodology, we designed nine-channel polarized spectral filter arrays in a wavelength range of 1350 nm to 1550 nm for transverse electric (TE) linear polarization. The array has a 10 nm balanced spectral resolution and average peak transmission efficiency of over 75%, which is maintained by utilizing lossless dielectric material. The proposed array can be fabricated using overlay e-beam lithography, and the process is CMOS-compatible. The proposed array enables broader applications of in situ on-chip polarization spectral detection with high efficiency and spectral resolution, as well as in vivo imaging systems.