Retroreflective gratings serve as fundamental optical elements in nanophotonics, with polarization-independent diffraction efficiency being one of the critical parameters for assessing their performance. In the far-infrared spectral range, traditional retroreflective gratings typically refer to metal echelette gratings, but their diffraction efficiency cannot approach 100% due to metal absorption. In the visible and near-infrared spectral ranges, metal echelette gratings have gradually been replaced by all-dielectric metasurfaces because dielectric materials exhibit negligible absorption at specific wavelengths. However, there is still a lack of relevant research in the far-infrared range, mainly due to the weak control capability of the existing devices over the polarization-independent phase. Here, we propose a kind of all-dielectric retroreflective metasurface composed of asymmetric pillars and freely tunable aperiodic multilayer films. The pillar structure can achieve polarization insensitivity, and the insufficient modulation capability of the dielectric materials can be compensated for by aperiodic Ge/ZnS films. The designed metasurface achieves the diffraction efficiency by RCWA, with the maximum larger than 99% and the overall reaching 95% (9.3–9.6 µm). We have provided detailed explanations of the design methodology and fabrication process. Our work lays the groundwork for further exploration and application of far-infrared lasers.